Stacked lateral overlap transducer (SLOT) based three-axis accelerometer
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01C-019/5769
H01L-041/312
H01L-041/311
H01L-041/25
G01C-019/5719
G01C-025/00
G01P-015/08
G01C-019/5712
G01P-015/125
G01P-015/18
G01C-019/5747
출원번호
US-0685375
(2015-04-13)
등록번호
US-10209072
(2019-02-19)
발명자
/ 주소
Stephanou, Philip Jason
Burns, David William
Shenoy, Ravindra Vaman
출원인 / 주소
SNAPTRACK Inc.
대리인 / 주소
Weaver Austin Villeneuve & Sampson LLP-QUAL
인용정보
피인용 횟수 :
0인용 특허 :
56
초록▼
This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for making and using accelerometers. Some such accelerometers include a substrate, a first plurality of electrodes, a second plurality of electrodes, a first anchor attached to the
This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for making and using accelerometers. Some such accelerometers include a substrate, a first plurality of electrodes, a second plurality of electrodes, a first anchor attached to the substrate, a frame and a proof mass. The substrate may extend substantially in a first plane. The proof mass may be attached to the frame, may extend substantially in a second plane and may be substantially constrained for motion along first and second axes. The frame may be attached to the first anchor, may extend substantially in a second plane and may be substantially constrained for motion along the second axis. A lateral movement of the proof mass in response to an applied lateral acceleration along the first or second axes may result in a change in capacitance at the first or second plurality of electrodes.
대표청구항▼
1. A method of fabricating a device, comprising: forming the following on a substrate that extends substantially in a first plane: a first plurality of electrodes substantially along a first axis;a second plurality of electrodes substantially along a second axis; anda first central anchor;forming a
1. A method of fabricating a device, comprising: forming the following on a substrate that extends substantially in a first plane: a first plurality of electrodes substantially along a first axis;a second plurality of electrodes substantially along a second axis; anda first central anchor;forming a frame and a proof mass that extend substantially in a second plane, wherein the frame is attached to the first central anchor and wherein forming the proof mass includes: forming a first plurality of slots, in the proof mass, that extend substantially along the first axis; andforming a second plurality of slots, in the proof mass, that extend substantially along the second axis,wherein forming the frame involves: forming first flexures that are configured for attaching the proof mass to the frame and for allowing the proof mass to move substantially along the first axis without causing the frame to move along the first axis, andforming second flexures that are configured for attaching the frame to the first central anchor, for substantially constraining the frame for motion along the second axis and for allowing the proof mass and the frame to move together along the second axis; andwherein the first and second pluralities of electrodes are formed substantially in a third plane that is disposed between the first plane and the second plane, the third plane separated from the second plane by a gap. 2. The method of claim 1, wherein forming the first and second plurality of electrodes on the substrate includes depositing the first and second plurality of electrodes on the substrate. 3. The method of claim 1, wherein forming the proof mass involves an electroplating process. 4. The method of claim 3, further comprising: partially forming features of a plurality of devices on the substrate; anddividing the substrate into sub-panels after the features are partially formed,wherein the electroplating process is performed using the sub-panels. 5. The method of claim 4, wherein partially forming the features involves deposition processes, patterning processes and etching processes. 6. The method of claim 3, wherein the electroplating process involves forming the proof mass in a thickness of tens of microns. 7. The method of claim 1, wherein the proof mass is formed from at least one metal selected from a group of metals consisting of nickel, nickel-iron, nickel-cobalt, nickel-manganese, cobalt-iron, nickel-tungsten, palladium-nickel and palladium-cobalt. 8. The method of claim 1, further comprising: encapsulating at least a portion of the device inside packaging. 9. The method of claim 8, further comprising: forming an electrical connection from the portion of the device inside the packaging to an area outside of the packaging. 10. The method of claim 8, further comprising: forming a seal ring, wherein the encapsulating involves attaching a cover to the seal ring. 11. The method of claim 10, wherein the cover includes metal or glass. 12. The method of claim 10, further comprising: forming an electrical pad outside of the seal ring, the electrical pad being capable of electrical connection with a conductive material. 13. The method of claim 1, wherein the process of forming the frame involves forming the frame around the first central anchor. 14. The method of claim 1, wherein the process of forming the proof mass involves forming the proof mass around the frame. 15. The method of claim 1, wherein the process of forming the proof mass involves forming one or more slots at least partially through the proof mass. 16. The method of claim 1, wherein the process of forming the frame involves forming a third plurality of slots in the frame and extending along the first axis. 17. The method of claim 1, wherein the process of forming the frame involves: forming a first portion coupled to the first central anchor; andforming stress isolation slits in the first portion proximate the first central anchor. 18. The method of claim 1, further comprising: forming a pivot on the substrate;forming a third electrode and a fourth electrode on the substrate;forming a second proof mass adjacent the pivot and configured for rotation about the pivot. 19. The method of claim 1, further comprising: depositing routing electrodes on the substrate;forming a second central anchor on the substrate;forming a first drive frame on the second central anchor;forming pairs of first drive beams on opposing sides of the second central anchor, the first drive beams connecting the first drive frame to the second central anchor, the first drive beams being configured to constrain the first drive frame to rotate substantially in the plane of the first drive beams;forming a third proof mass around the first drive frame; andforming a plurality of first sense beams that connect the first drive frame to the third proof mass, the first sense beams being configured to allow sense motions of the third proof mass in a sense plane substantially perpendicular to the plane of the first drive beams in response to an applied angular rotation, the first sense beams being configured to substantially decouple the sense motions of the third proof mass from motions of the first drive frame,wherein forming the first drive beams includes the following: depositing a first metal layer that is in contact with the routing electrodes;depositing a piezoelectric layer on the first metal layer;depositing a second metal layer on the piezoelectric layer; andelectroplating a third metal layer on the second metal layer. 20. The method of claim 1, further comprising: forming a first sense frame;forming a third proof mass disposed outside the first sense frame;forming a pair of anchors on the substrate;forming a plurality of second drive beams disposed on opposing sides of the first sense frame and between the pair of anchors, the second drive beams connecting the first sense frame to the third proof mass, each of the second drive beams including a piezoelectric layer and configured to cause drive motions of the third proof mass; andforming a plurality of second sense beams including a layer of piezoelectric sense electrodes, the second sense beams configured for connecting the first sense frame to the pair of anchors,wherein the first sense frame is substantially decoupled from the drive motions of the third proof mass, andwherein the plurality of second drive beams are formed from a first metal layer, the piezoelectric layer, a second metal layer and a third metal layer. 21. The method of claim 1, further comprising: forming a second central anchor on the substrate;forming a second sense frame disposed around the second central anchor;forming a plurality of third sense beams, each of the third sense beams including a layer of piezoelectric sense electrodes, the third sense beams configured for connecting the second sense frame to the second central anchor;forming a second drive frame disposed around and coupled to the second sense frame, the second drive frame including a first side and a second side;forming a plurality of piezoelectric third drive beams disposed on opposing sides of the second sense frame, the third drive beams configured to drive the first side of the second drive frame in a first direction along a first axis in the plane of the second drive frame, the third drive beams being further configured to drive the second side of the second drive frame in a second and opposing direction along the third axis;forming a second drive frame suspension configured to substantially restrict a drive motion of the second drive frame to that of a substantially linear displacement along the third axis; andforming a second sense frame suspension configured to be compliant to rotation around a fourth axis orthogonal to the third axis, but configured to resist translational motion along the third axis,wherein the plurality of third sense beams are formed from a first metal layer, a piezoelectric layer, a second metal layer and a third metal layer. 22. The method of claim 1, wherein the device includes at least one inertial sensor device selected from a group of inertial sensor devices consisting of an accelerometer and a gyroscope.
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