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Kafe 바로가기주관연구기관 | 한국표준과학연구원 Korea Research Institute of Standards and Science |
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연구책임자 | 안상정 |
참여연구자 | 손동희 |
보고서유형 | 최종보고서 |
발행국가 | 대한민국 |
언어 | 한국어 |
발행년월 | 2018-08 |
과제시작연도 | 2017 |
주관부처 | 과학기술정보통신부 Ministry of Science and ICT |
등록번호 | TRKO201900025443 |
과제고유번호 | 1711059067 |
사업명 | 나노·소재기술개발 |
DB 구축일자 | 2020-08-29 |
키워드 | 헬륨이온현미경.가스장이온소스.이온빔광학계.정전광학계.이온빔전산시늉.Helium Ion Microscope.Gas Field Ion Source.Ion Opticla Column.Electrostatic Optics.Ion Beam Simulation. |
헬륨이온현미경에 활용될 수 있는 세부기술로는, 헬륨이온총 원천기술로 5%의 안정도를 가진 단원자 이온빔 생성기술을 개발하였다. 이온광학 결상계로 5 nm 급이온빔 광학결상계를 제작하여 회로구성, 빔제어, 신호측정을 진행하여, 실재 활용할 수 있는 시스템을 구축하였다. 개발된 이온소스 기술과 이온광학계 시스템을 결합하여 그 성능을 확인하기 위하여 자체적으로 설계한 이온현미경 시작품을 제작하여 그 가능성을 확인하였다. 이온빔과 유기박막과의 상호작용을 살필 수 있는 시료반응을 전산모사 하고, 응용연구를 진행하여, 전자빔나노계측장비에 상보
헬륨이온현미경에 활용될 수 있는 세부기술로는, 헬륨이온총 원천기술로 5%의 안정도를 가진 단원자 이온빔 생성기술을 개발하였다. 이온광학 결상계로 5 nm 급이온빔 광학결상계를 제작하여 회로구성, 빔제어, 신호측정을 진행하여, 실재 활용할 수 있는 시스템을 구축하였다. 개발된 이온소스 기술과 이온광학계 시스템을 결합하여 그 성능을 확인하기 위하여 자체적으로 설계한 이온현미경 시작품을 제작하여 그 가능성을 확인하였다. 이온빔과 유기박막과의 상호작용을 살필 수 있는 시료반응을 전산모사 하고, 응용연구를 진행하여, 전자빔나노계측장비에 상보적인 응용분야를 발굴하였다.
(출처 : 요약서 3p)
□ Purpose
In order to develop the technologies for sub-nm resolution helium ion microscope, the core technologies for following 3 categories has been conducted such as Helium ion gun, Ion beam optical system, Ion beam microscope platform and application. In detail, the methodology to apply ion em
□ Purpose
In order to develop the technologies for sub-nm resolution helium ion microscope, the core technologies for following 3 categories has been conducted such as Helium ion gun, Ion beam optical system, Ion beam microscope platform and application. In detail, the methodology to apply ion emission from atom tip to ion microscope, research to on the structure and prototype, engineering of electrostatic lens and electronic parts, simulation system, and methodologies to measure the soft-materials in nanoscale.
□ Results
As a detailed technology that can be applied to the helium ion microscope,we have developed a new single ion beam generation technology with 5% stability with the total helium ion source technology. The GFIS type ion beam generation and evaluation system infrastructure, which operates only in ultra-low temperature and ultra-high vacuum environment, has been established. High voltage electric system prepared for ion generation and ionbeam control. We fabricated a 5 nm class ion beam optical imaging system with ion optical imaging system, and constructed a system that can make practical use by conducting circuit configuration, beam control, and signal measurement. We designed, manufactured, and operated a 30 kV electrostatic type objective lens as the home-made system of the ion beam optical system. We developed and secured a computer simulator that can theoretically examine the optical system. In order to verify the performance of the ion source system and the ion source system developed for the construction of the microscope platform, the LMIS ion microscope and the GFIS ion microscope prototype were designed and confirmed. We have simulated the sample reaction which can investigate the interaction between the ion beam and the organic thin film and applied the research using HIM in the field to find applications that can be used complementarily to the nano measurement equipment using electron beam. Through a series of R & D processes, we secured scientific and technological papers and intellectual property rights, and expanded the base of development of ion beam generation technology and ion microscope without GFIS system in domestic.
□ Expected contribution
○ Enhancement of charged optical technology: HIM development covers all aspects of ion optics technology. The successful development of Helium Ion Microscope means that the optical technology of the charged particle optics reaches the world's highest level, and based on this, it is possible to develop various kinds of high performance charged particle research equipments.
○ Research on the defect in semiconductor device: It is possible to research for defects that can not be detected accurately by using light or electron beam which is used for inspection of semiconductor devices, such as ultrafine structures deep in a thick sample. Domestic semiconductor manufacturers, which are at the highest level in device development, are ahead of their competitors.○ Entering the high-end microscope market: Atomic resolution electron / ion microscope is a high-value-added device with billions of won in price. Currently, some advanced countries such as Japan, Germany, USA, UK and France are dominating and we have not entered yet. By transferring the related technology developed through this research to the industry and realizing the industrialization, it is possible to enter into the high-value-added advanced equipment market.
(출처 : SUMMARY 5p)
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