초록

용어보기논문에서 용어와 풀이말을 자동 추출한 결과로, 시범 서비스 중입니다. AI-Helper

Abstract ▼ AI-Helper

Permeation behavior of the semiconductor rinsing wastewater contammg Si particles was examined by ultrafiltration using the polyolefin tubular membrane. Flux decline with time was due to the growth of Si cake deposited on the membrane surface and the pore plugging by Si particles. Cake filtration fr...

Permeation behavior of the semiconductor rinsing wastewater contammg Si particles was examined by ultrafiltration using the polyolefin tubular membrane. Flux decline with time was due to the growth of Si cake deposited on the membrane surface and the pore plugging by Si particles. Cake filtration from the cross flow application is compared to the combination of pore blocking and cake filtration from the dead-end application. The cake resistance is 3.16 x $10^{12}$ -4.34 X $\times$$10^{12}$ $m^{-1}$ for the cross flow and 6.6 x $\times$$10^{12}$ -12.19 X $\times$$10^{12}$ $\times$$m^{-1}$for the dead-end flow, respectively. At the initial stage of operation, permeation flux of cross flow type was 1.7 time higher than that of the dead end flow type. Permeation flux of cross flow was about 42 e 1m2 hr and the rejection rate of Si particles was about 96 %. The average particle size of Si particle in the permeate was 20 nm.