Ta(5 nm)/NiFe(11 nm)/FeMn(16 nm) Ta(5 nm)과 Ta(5 nm)/NiFe(11 run)/FeMn(16 nm)/NiFe(7 nm)/Ta(5 nm) 다층박막구조를 제작하여, Laser의 power, 조사 위치, 자장의 방향에 따라 자기저항(MR)비와 교환결합력(H$_{ex}$) 자기적 특성을 연구하였다. Laser 열처리는 power를 440 mW까지 증가시키면서 FeMn/NiFe 이중박막을 15분 씩 Laser로 조사하여, 200 mW에서부터 음의 자기장에서 자기저항곡선의 피크가 발생하기 시작하였다. 400 mW까지 증가시키면서 양의 자기장에서 자기저항곡선의 MR비와 H$_{ex}$:가 각각 0.9%에서 0.1%로, 87 Oe에서 76 Oe로 감소하였고, 음의 자기장 피크에서는 MR비와 H$_{ex}$가 모두 증가하였다. 또한 NiFe/FeMn/NiFe삼중박막에서도 같은 결과를 얻었다. 300 mA로 laser열처리한 면적을 증가시켰을 때 자기저항곡선이 positive 피크는 감소하고 negative 피크는 증가하였다. 이러한 Laser 열처리효과에 의해 결과적으로 교환결합된 박막구조의 국소적 자화반전을 가능하게 하였다.
Ta(5 nm)/NiFe(11 nm)/FeMn(16 nm) Ta(5 nm)과 Ta(5 nm)/NiFe(11 run)/FeMn(16 nm)/NiFe(7 nm)/Ta(5 nm) 다층박막구조를 제작하여, Laser의 power, 조사 위치, 자장의 방향에 따라 자기저항(MR)비와 교환결합력(H$_{ex}$) 자기적 특성을 연구하였다. Laser 열처리는 power를 440 mW까지 증가시키면서 FeMn/NiFe 이중박막을 15분 씩 Laser로 조사하여, 200 mW에서부터 음의 자기장에서 자기저항곡선의 피크가 발생하기 시작하였다. 400 mW까지 증가시키면서 양의 자기장에서 자기저항곡선의 MR비와 H$_{ex}$:가 각각 0.9%에서 0.1%로, 87 Oe에서 76 Oe로 감소하였고, 음의 자기장 피크에서는 MR비와 H$_{ex}$가 모두 증가하였다. 또한 NiFe/FeMn/NiFe삼중박막에서도 같은 결과를 얻었다. 300 mA로 laser열처리한 면적을 증가시켰을 때 자기저항곡선이 positive 피크는 감소하고 negative 피크는 증가하였다. 이러한 Laser 열처리효과에 의해 결과적으로 교환결합된 박막구조의 국소적 자화반전을 가능하게 하였다.
We have studied local magnetization reversal and magnetic properties induced by Laser annealing method in the strip-patterned Ta/NiFe/FeMn/Ta and Ta/NiFe/FeMn/NiFe/Ta multilayers fabricated by ion-beam deposition. The films were exposed to the emission of the DPSS (Diode Pumped Solid State, Nd:YAG) ...
We have studied local magnetization reversal and magnetic properties induced by Laser annealing method in the strip-patterned Ta/NiFe/FeMn/Ta and Ta/NiFe/FeMn/NiFe/Ta multilayers fabricated by ion-beam deposition. The films were exposed to the emission of the DPSS (Diode Pumped Solid State, Nd:YAG) laser under 600 G. The laser beam intensity increased up to 440 mW. When the laser illuminated the patterned film with the power of above 200 m W, the intensity of MR peak located in +87 Oe shrunk. A new MR peak was generated at -63 Oe. When the laser power is 400 mW, the location of positive MR peak(H$_<$TEX>ex/) was changed slightly from +87 Oe to +76 Oe, and the MR ratio was decreased from 0.9% to 0.1 %. On the other hand, the new (negative) MR peak shifted from -63 Oe to -80 Oe, with the MR ratio increased up to 0.3%. As the illuminated area expanded, the intensity of opposite MR peak increased and it of negative MR peak decreased. This proved that the local reversal of exchange biasing should be realized by laser annealing.
We have studied local magnetization reversal and magnetic properties induced by Laser annealing method in the strip-patterned Ta/NiFe/FeMn/Ta and Ta/NiFe/FeMn/NiFe/Ta multilayers fabricated by ion-beam deposition. The films were exposed to the emission of the DPSS (Diode Pumped Solid State, Nd:YAG) laser under 600 G. The laser beam intensity increased up to 440 mW. When the laser illuminated the patterned film with the power of above 200 m W, the intensity of MR peak located in +87 Oe shrunk. A new MR peak was generated at -63 Oe. When the laser power is 400 mW, the location of positive MR peak(H$_<$TEX>ex/) was changed slightly from +87 Oe to +76 Oe, and the MR ratio was decreased from 0.9% to 0.1 %. On the other hand, the new (negative) MR peak shifted from -63 Oe to -80 Oe, with the MR ratio increased up to 0.3%. As the illuminated area expanded, the intensity of opposite MR peak increased and it of negative MR peak decreased. This proved that the local reversal of exchange biasing should be realized by laser annealing.
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