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NTIS 바로가기International journal of maritime information and communication sciences, v.3 no.4, 2005년, pp.191 - 194
Mun Sei-Young (Department of Electronic Engineering at Myongji University) , Kim Gwang-Beom (Department of Electronic Engineering at Myongji University) , Soh Dea-Wha (Department of Electronic Engineering and director of semiconductor technology center at Myongji University) , Hong Sang Jeen (Department of Electronic Engineering & NBRC at Myongji University)
SU-8 is a epoxy based photoresist designed for MEMS applications, where a thick, chemically and thermally stable image are desired. However SU-8 has proven to be very sensitive to variation in processing variables and hence difficult to use in the fabrication of useful structures. In this paper, neg...
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M. Despont, H. Lorenz, N. Fahrni, J. Brugger, P. Renaud, and P. Vettiger, 'High-aspect ratio ultrathick, negative tone near-UV photoresist for MSMS applications,' In Proc. IEEE, 10th Annual Int. Workshop in Micro Eletro Mechanical Systems, Nagoya, Japan, pp. 518-522, Jan. 1997
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Robert H. Carver, 'Doing Data Analysis with MINITAB 14,' Brooks Cole., 2003
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