[논문]SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge

Jeong, Soo-Yeon; Kim, Ji-Hun; Hwang, Yong-Seuk; Kim, Gon-Ho

doi:10.4313/teem.2006.7.4.204

SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 원문보기

Transactions on electrical and electronic materials, v.7 no.4, 2006년, pp.204 - 209

Jeong, Soo-Yeon (Department of Nuclear Engineering, Seoul National University) , Kim, Ji-Hun (Department of Nuclear Engineering, Seoul National University) , Hwang, Yong-Seuk (Department of Nuclear Engineering, Seoul National University) , Kim, Gon-Ho (Department of Nuclear Engineering, Seoul National University)

Abstract ▼ AI-Helper

Photo Resist (PR) ashing process was carried out with the atmospheric pressure- dielectric barrier discharge (ADBD) using $SF_6/N_2/O_2$. Ashing rate (AR) was sensitive to the mixing ratio of the oxygen and nitrogen of the blower type of ADBD asher. The maximum AR of 5000 A/min was achieved at 2% of oxygen in the $N_2$ plasma. With increasing the oxygen concentration to more than 2% in the $N_2$ plasma, the discharge becomes weak due to the high electron affinity of oxygen, resulting in the decrease of AR. When adding 0.5% of SF6 to $O_2/N_2$ mixed plasma, the PR AR increased drastically to 9000 A/min and the ashed surface of PR was smoother compared to the processed surface without $SF_6$. Carbon Fluorinated polymer may passivate the PR surface. It was also observed that the glass surface was not damaged by the fluorine.

주제어

AI 본문요약
AI-Helper

* AI 자동 식별 결과로 적합하지 않은 문장이 있을 수 있으니, 이용에 유의하시기 바랍니다.

문제 정의

The properties of discharge and process are considered simultaneously to figure out the characteristics of the system, which play an important role in the development of the process system. Because the ashing process of photoresistor on the glass is the large scale of the process in the semiconductor or TFT- LCD fabrications, this study is focused on the development of the asher using DBD. The characteristics of DBD have been investigated with the operating frequency and the reactor capacitance, obtaining the design rule of DBD process reactor[6].

가설 설정

By Comparing experiment OES result with simulated Gaussian profile which is acquired using eq. (3), the vibration temperature and rotation temperature was meas나red. In this study, the temperature of nitrogen molecules is observed using nitrogen molecule spectrum (C₃ IIu) from OES data[13].
As seen from eq. 4, the discharge cxirrent increases in accordance with the increase in the discharge density. And O radicals which strip the PR are generated more as discharge current is increased.

제안 방법

In this study, PR ashing process is performed using the ' blower type of atmospheric dielectric barrier discharge (DBD). Major ashing processes are carried out through the reaction of oxygen radicals with the hydrogen and carbon atoms in PR, producing the volatile molecules of CO₂ and H₂O.
The dissipated power could be monitored using the discharge voltage, current, and charges. Optical emission spectroscopy was focused at the extraction hole of the lower electrode measure the vibrational and rotational temperatures of nitrogen radicals, and also monitored the species in the discharge [11, 13]. Ellipsometry and scanning electron microscopy (SEM) are employed to study the AR and surface morphology.

대상 데이터

5 gm. The test coupon size was 3 cm x 3 cm glass, which was located at 1.8 mm beneath the reactor. Oxygen and sulfur hexafluoride with nitrogen basis were mixed, delivering in the discharge region of the DBD blower.

참고문헌 (20)

http://snf.stanford.edu/Process/WetProcessing/ResistStrip.html
J. Y. Jeong, S. E. Babayan, V. J. Tu, J. Park, I. Henins, R. F. Hicks, and G. S. Selwyn, 'Etching materials with an atmospheric-pressure plasma jet', Plasma Sources Sci. Technol., Vol. 7, p. 282, 1998

상세보기
O. Goossens, E. Dekempeneer, D. Vangeneugden, R. Van de Leest, and C. Leys, 'Application of atmospheric pressure dielectric barrier discharges in deposition, cleaning and activation', Surface and Coatings technology, Vol. 142-144, p. 474, 2001

상세보기
Y. H. Kim, J. M. Park, and S. H. Hong, 'Geometrical effects of the discharge system on the corona discharge and chemically active species generated in wire-cylinder and wire-plate reactors', J. Korean Phys. Soc., Vol. 44, p. 1458, 2004

상세보기
Y.-H. Lee and G.-Y. Yeom, 'Characteristics of a pin-to-plate dielectric barrier discharge in helium', J. Korean Phys. Soc., Vol. 47, p. 74, 2005

상세보기
S.-H. Song, D. Kwon, M. P. Hong, and G.-H. Kim, 'The characteristics of the atmospheric pressure plasma', The 12th Korean Conference on Semiconductors, Vol. 2, p. 415, 2005
S. G. Song, Patent No. 10-2004-0023877, Korea
Plasmart, Patent No. 10-2002-0019526, Korea
Sekisui Chemical, Patent No. 10-2003-7006459, Korea
SEM technology, Patent No. 10-0476136-0000, Korea
K. V. Kozlov, H.-E. Wagner, R. Brandenburg, and P. Michel, 'Spatio-temporally resolved spectroscopic diagnostics of the barrier discharge in air at atmospheric pressure', J. Phys. D: Appl. Phys., Vol. 34, p. 3164, 2001

상세보기
H. J. Yoon and T. H. Chung, 'Calculation of radial profiles of oxygen atoms in high-density oxygen discharges', J. Korean Phys. Soc., Vol. 44, p. 1033, 2004
J. H. Kim and Y. Hwang, 'The measurement of the electron density and temperature using an OES', Physics of Plasma (submitted in 2006)
J. H. Kim, Y. H. Kim, Y. H. Choi. W. Choe, J. J. Choi, and Y. S. Hwang, 'Optical measurements of gas temperatures in atmospheric pressure RF cold plasmas', Surface and Coatings technology, Vol. 71, p. 211, 2003
C. de Izarra, 'UV OH spectrum used as a molecular pyrometer', J. Phys. D : Appl. Phys., Vol. 33, p. 1697, 2000

상세보기
Q. Jin, Y. Duan, and J. A. Olivares, 'Development and investigation of microwave plasma techniques in analytical atomic spectrometry', Spectrochim. Acta B, Vol. 52, p. 131, 1997

상세보기
G. Herzberg and J. W. T. Sprinks, 'Molecular spectra and molecular structure : I. Spectra of diatomic molecules 2nd Edition', Van Nostrand Reinhold Company, p. 200, 1964
E. C. M. Chen, J. R. Wiley, C. F. Batten, and W. E. Wentworth, 'Determination of the electron affinities of molecules using negative ion mass spectrometry', J. Phys. Chem., Vol. 98, p. 88, 1994

상세보기
K. M. Ervin, I. Anusiewicz, P. Skurski, J. Simons, and W. Carl Lineberger, 'The only stable state of O2-Is the X 2 II g ground state and it (Still!) has an adiabatic electron detachment energy of 0.45 eV', J. Phys. Chem. A, Vol. 107, p. 8521, 2003

상세보기
M. A. Lieberman and A. J. Lichenberg, 'Principles of plasma discharges and materials processing 2nd Edition', Wisley-interscience, p. 393 ,2005

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 논문명, 저널/프로시딩명, 저자 , 발행년, 권, 호, 시작페이지, 끝페이지, 발행기관 관리번호, 논문명, 대등논문명, 저자 , 저널/프로시딩명, 발행기관, 발행년, 발행언어, 권, 호, 시작페이지, 끝페이지, ISBN, ISSN, 주제분야, 키워드, 초록(한글), 초록(영문), 저자(소속기관)
저장형식	Text(ASCII format) Excel format RefWorks Direct Export RIS format (for Reference Manager, ProCite, EndNote), Scholar's Aids, Mendeley
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 원문보기

Abstract ▼ AI-Helper

주제어

AI 본문요약
AI-Helper

문제 정의

가설 설정

제안 방법

대상 데이터

참고문헌 (20)

이 논문을 인용한 문헌

저자의 다른 논문 :

관련 콘텐츠

원문 보기

원문 URL 링크

오픈액세스(OA) 유형

이 논문과 함께 이용한 콘텐츠

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 원문보기

Abstract ▼ AI-Helper

주제어

AI 본문요약 엑셀 다운로드 AI-Helper

문제 정의

가설 설정

제안 방법

대상 데이터

참고문헌 (20)

이 논문을 인용한 문헌

저자의 다른 논문 :

황용석 (4) 김곤호 (13)

관련 콘텐츠

원문 보기

원문 URL 링크

오픈액세스(OA) 유형

이 논문과 함께 이용한 콘텐츠

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

AI 본문요약
AI-Helper