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大韓機械學會論文集. Transactions of the Korean Society of Mechanical Engineers. A. A, v.30 no.10 = no.253, 2006년, pp.1314 - 1319
김종현 (포항 가속기 연구소) , 이승섭 (한국과학기술원 기계공학과) , 김용철 (한국과학기술원 기계공학과)
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This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with
Madou M. J., 2002, 'Fundamentals of Micro- fabrication,' CRC Press, pp. 53-57
Chou S. Y., Krauss P. R. and Renstrom P. J., 1996, 'Nanoimprint Lithography,' J. Vac. Sci. Technol., Vol. 14, pp. 4129-4133
Ginger D. S., Zhang H. and Mirkin C. A., 2004, 'The Evolution of Dip-Pen Nanolithography,' Ang. Chem., Vol. 43, No.1, pp. 30-45
Seo Y. H., Choi D. S., Lee J. H., Je T. J. and Whang K. H., 2004, 'Fabrication of High Aspect Ratio 100nm-scale Nickel Stamper Using E-beam Writing based on Chrome/Quartz Mask Without Anti-Reflection Layer for Injection Molding of Optical Grating,' Trans. of the KSME (A), Vol. 28, No. 11, pp. 1794-1798
Brugger J., Berenschot J. W., Kuiper S., Nijdam W., Otter B. and Elwenspoek M., 2000, 'Resistless Patterning of Sub-Micron Structures by Evaporator Through Nanostencils,' Microelectron. Eng., Vol. 53, pp. 403-405
Kim G. M., M. A. F. van den Boogaart, and Brugger J., 2003, 'Fabrication and Application of a Full Wafer Size Micro/Nanostencil for Multiple Length-Scale Patterning,' Microelectron. eng., Vol. 67-68, pp. 609-614
Schumacher C. and Faschinger W., 2000, 'Self-Organized Nucleation of Sharply Defined Nanostructures During Growth into Shadow Mask,' J. cryst. growth, Vol. 214-215, pp. 732-736
Blech V., Nobuyuki T. and Kim B. J., 2005, 'Nano Stencilling Through a $cm^2$ -wide Silicon Membrane,' Proc. Korean MEMS Conf, pp. 451-454
Perennes F. and Pantenburg F. J., 2001, 'Adhesion Improvement in the Deep X-Ray Lithography Process Using a Central Beam Stop,' Nucl. Instrum. Methods Phys. Res., Sect. B, Beam Interact. Mater. Atoms, Vol. 174, pp. 317-323
Guckel H., 1998, 'High-Aspect-Ratio Micro-maching via Deep X-Ray Lithography,' Proc. IEEE98, Vol. 80, pp. 1586-1593
Lee K. C. and Lee S. S., 2003, 'Deep X-Ray Mask with Integrated Actuator for 3D Microfabrication,' Sens. Actuator A, Vol. 108, pp. 121-127
Bar E., and Lorenz J., 1996, '3-D Simulation of LPCVD Using Segment-Based Topography Discretization,' IEEE Trans. Semicond. Manuf, Vol. 9, No.1, pp. 67-73
Lee S. J., Kim G. M., 2006, 'Fabrication of Nanostencil Using Additional Deposition' Proc. of the KSME 2006 Spring Annual Meeting, pp. 4082-4086
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