최소 단어 이상 선택하여야 합니다.
최대 10 단어까지만 선택 가능합니다.
다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기윤활학회지 = Journal of the Korean Society of Tribologists and Lubrication Engineers, v.24 no.5, 2008년, pp.255 - 263
김광섭 (한국과학기술원 기계항공시스템학부) , 강지훈 (삼성전자(주) 반도체총괄 스토리지사업부) , 김경웅 (한국과학기술원 기계항공시스템학부)
Adhesion tests were conducted to investigate the adhesion characteristics between mold and thermoplastic polymer film. Coating of anti-sticking layer (ASL), a kind of polymer material, imprint pressure, and separation velocity were considered as the process conditions. A piece of fused silica withou...
* AI 자동 식별 결과로 적합하지 않은 문장이 있을 수 있으니, 이용에 유의하시기 바랍니다.
Chou, S. Y., Krauss, P. R., and Renstrom, P. J. 'Imprint of sub-25 nm Vias and Trenches in Polymers', Appl. Phys. Lett., Vol. 67, No. 21, pp. 3114-3116, 1995
Guo. L. J., 'Recent Progress in Nanoimprint Technology and its Applications', J. Phys. D:Appl. Phys., Vol. 37, pp. R123-R141, 2004
Macintyre, D. S., Chen, Y., Gourlay, D., Boyd, E., Moran, D., Cao, X., Elgaid, K., Stanley, C. R., Thayne, I., and Thoms, S., 'Nanoimprint Lithography Process Optimization for the Fabrication of High Electron Mobility Transistors', J. Vac. Sci. Technol. B, Vol. 21, No. 6, pp. 2783-2787, 2003
Zhang, W. and Chou, S. Y., 'Fabrication of 60-nm Transistors on 4-in. Wafer Using Nanoimprint at All Lithography Levels', Appl. Phys. Lett., Vol. 83, No. 8, pp. 1632-1634, 2003
Ye, P. D., Wilk, G. D., Tois, E. E., and Wang, J. J., 'Formation and Characterization of Nanometer Scale Metal-oxide-semiconductor Structures on GaAs Using Low-temperature Atomic Layer Deposition', Appl. Phys. Lett., Vol. 87, No. 1, pp. 13501-13503, 2005
Puscasu, I., Boreman, G., Tiberio, R. C., Spencer, D., and Krchnavek, R. R., 'Comparison of Infrared Frequency Selective Surfaces Fabricated by Direct-write Electron-beam and Bilayer Nanoimprint Lithographies', J. Vac. Sci. Technol. B, Vol. 18, No. 6, pp. 3578-3581, 2000
Ahn, S. W., Lee, K. D., Kim, D. H., and Lee, S. S., 'Polymeric Wavelength Filter Based on a Bragg Grating Using Nanoimprint Technique', IEEE Photon. Technol. Lett., Vol. 17, No. 10, pp. 2122-2124, 2005
Arakcheeva E. M., Tanklevskaya E. M., Nesterov S. I., Maksimov M. V., Gurevich S. A., Seekamp J., and Torres C. M. S., 'Fabrication of Semiconductorand Polymer-based Photonic Crystals Using Nanoimprint Lithography', Tech. Phys., Vol. 50, No. 8, pp. 1043-1047, 2005
Cheng, X., Hong, Y. T., Kanicki, J., and Guo, L. J., 'High-resolution Organic Polymer Light-emitting Pixels Fabricated by Imprinting Technique', J. Vac. Sci. Technol. B, Vol. 20, No. 6, pp. 2877-2880, 2002
Kao, P. C., Chu, S. Y., Chen, T. Y., Zhan, C. Y., Hong, F. C., Chang, C. Y., Hsu, L. C., Liao, W. C., and Hon, M. H., 'Fabrication of Large-scaled Organic Light Emitting Devices on the Flexible Substrates Using Low-pressure Imprinting Lithography', Elec. Dev., IEEE Transactions, Vol. 52, No. 8 pp. 1722-1726, 2005
Ahn, S. W., Lee, K. D., Kim, J. S., Kim, S. H., Park, J. D., Lee, S. H., and Yoon, P. W., 'Fabrication of a 50 nm Half-pitch Wire Grid Polarizer Using Nanoimprint Lithography', Nanotechnology, Vol. 16, No. 9, pp. 1874-1877, 2005
Ohtake, T., Nakamatsu, K. I., Matsui, S., Tabata, H., and Kawai, T., 'DNA Nanopatterning with Selforganization by Using Nanoimprint', J. Vac. Sci. Technol. B, Vol. 22, No. 6, pp. 3275-3278, 2004
Bunk, R., Carlberg, P., Mansson, A., Nicholls, I. A., Omling, P., Sundberg, M., Tagerud, S., and Montelius, L., 'Guiding Molecular Motors with Nano-Imprinted Structures', Jap. J. Appl. Phys. part 1, Vol. 44, No. 5A, pp. 3337-3340, 2005
Austin, M. D., Ge, H. X., Wu, W., Li, M. T., Yu, Z. N., Wasserman, D., Lyon, S. A., and Chou, S. Y., 'Fabrication of 5 nm Linewidth and 14 nm Pitch Features by Nanoimprint Lithography', Appl. Phys. Lett., Vol. 84, No. 26, pp. 5299-5301, 2004
Hirai, Y., Yoshida, S., and Takagi, N., 'Defect Analysis in Thermal Nanoimprint Lithography', J. Vac. Sci. Technol. B, Vol. 21, No. 6, pp. 2765-2770, 2003
Hirai, Y., Yoshida, S., Takagi, N., Tanaka, Y., Yabe, H., Sasaki, K., Sumitani, H., and Yamamoto, K., 'High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold', Jap. J. Appl. Phys. Part 1, Vol. 42, pp. 3863-3866, 2003
Jaszewski, R. W., Schift, H., Groning, P., and Margaritondo, G., 'Properties of Thin Anti-adhesive Films Used for the Replication of Microstructures in Polymers', Microelectron. Eng., Vol. 45, No. 1-4, pp. 381-384, 1997
Beck, M., Graczyk, M., Maximov. I., Sarwe, E. L., T. G. I. Ling, Keil, M., and Montelius, L., 'Improving Stamps for 10 nm Level Wafer Scale Nanoimprint Lithography', Microelectron. Eng., Vol. 61-62, pp. 441-448, 2002
Chen, J. K., Ko, F. H., Hsieh, K. F., Chou, C. T., and Chang, F. C., 'Effect of Fluoroalkyl Substituents on the Reactions of Alkylchlorosilanes with Mold Surfaces for Nanoimprint Lithography', J. Vac. Sci. Technol. B, Vol. 22, No. 6, pp. 3233-3241, 2004
Schift, H., Saxer, S., Park, S. G., Padeste, C., Pieles, U., and Gobrecht, J., 'Controlled Co-evaporation of Silanes for Nanoimprint Stamps', Nanotechnology, Vol. 16, pp. S171-S175, 2005
Park, S., Schift, H., Padeste, C., Schnyder, B., Kotz, R., and Gobrecht, J., 'Anti-adhesive Layers on Nickel Stamps for Nanoimprint Lithography', Microelectronic Eng., Vol. 73-74, pp. 196-201, 2004
Tallal, J., Gordon, M., Berton, K., Charley, A. L., and Peyrade, D., 'AFM Characterization of Antisticking Layers Used in Nanoimprint', Microelectron. Eng., Vol. 83, pp. 851-854, 2006
Ulman, A., 'Formation and Structure of Self-assembled Monolayers', Chem. Rev., Vol. 96, pp. 1533-1554, 1996
Ja czuk, B., Bialopiotrowicz, T., and Zdziennicka, A., 'Some Remarks on the Components of the Liquid Surface Free Energy', J. Colloid. Interface Sci., Vol. 211, pp. 96-103, 1999
Kasai, T., Bhushan, B., Kulik, G., Barbieri, L., and Hoffmann, P., 'Micro/nanotribological Study of Perfluorosilane SAMs for Antistiction and Low Wear', J. Vac. Sci. Technol. B, Vol. 23, No. 3, pp. 995-1003, 2005
Jones, Richard A.L., and Richards, Randal W., Polymers at surfaces and interfaces, Cambridge University, pp. 293, 1999
*원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다.
출판사/학술단체 등이 한시적으로 특별한 프로모션 또는 일정기간 경과 후 접근을 허용하여, 출판사/학술단체 등의 사이트에서 이용 가능한 논문
※ AI-Helper는 부적절한 답변을 할 수 있습니다.