[논문]Effects of Sputter Parameters on Electrochromic Properties of Tungsten Oxide Thin Films Grown by RF Sputtering

Nah, Yoon-Chae

doi:10.3740/mrsk.2011.21.12.703

Effects of Sputter Parameters on Electrochromic Properties of Tungsten Oxide Thin Films Grown by RF Sputtering 원문보기

한국재료학회지 = Korean journal of materials research, v.21 no.12, 2011년, pp.703 - 707

Nah, Yoon-Chae (School of Energy.Materials.Chemical Engineering, Korea University of Technology and Education)

Abstract ▼ AI-Helper

The electrochromic properties of tungsten oxide films grown by RF sputtering were investigated. Among the sputter parameters, first the $Ar:O_2$ ratios were controlled with division into only an $O_2$ environment, 1:1 and 4:1. The structure of each film prepared by these conditions was studied by X-ray diffraction, X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. The sputter-deposited tungsten oxide films had an amorphous structure regardless of the $Ar:O_2$ ratios. The chemical compositions, however, were different from each other. The stoichiometric structure and low-density film was obtained at higher $O_2$ contents. Electrochemical tests were performed by cyclic voltammetry and chronoamperometry at 0.05 M $H_2SO_4$ solutions. The current density and charge ratio was estimated during the continuous potential and pulse potential cycling at -0.5 V and 1.8 V, respectively. The film grown in a higher oxygen environment had a higher current density and a reversible charge reaction during intercalation and deintercalation. The in-situ transmittance tests were performed by He-Ne laser (633 nm). At higher oxygen contents, a big transmittance difference was observed but the response speed was too slow. This was likely caused by higher film resistivity. Furthermore, the effect of sputtering pressure was also investigated. The structure and surface morphology of each film was observed by X-ray diffraction and scanning electron microscopy. A rough surface was observed at higher sputtering pressure, and this affected the higher transmittance difference and coloration efficiency.

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제안 방법

In order to investigate the effect of sputtering pressure on electrochromic properties, three different gas pressures were employed; 5, 10, 20 mTorr. It is confirmed that films are slowly deposited at higher pressure, which is because sputtered tungsten atoms are scattered by gas molecules before deposition and therefore mean free path of the atoms are shorten.

대상 데이터

Tungsten oxide films were grown by using an RF mag-netron sputtering system. ITO (Samsung Corning Co, Ltd.) coated transparent glass was used as the substrate. The thickness and resistivity of the ITO was about 800 Å and 50 Ω/square.
The films thickness of all the tungsten oxide films were carefully measured by cross-sectional scanning electron microscopy (SEM, D/Max-2400, Rigaku) and the film density was calculated using Rutherford backscattering spectroscopy (RBS, 3SDH, NEC) data. The thickness of the films prepared here were 200, 190 and 200 nm for only O₂, 1:1 and 4:1, respectively. A dose of 10 µC of He⁺⁺ ions was used to obtain RBS spectra.

참고문헌 (16)

S. K. Deb, Phil. Mag., 27, 801 (1973).

상세보기
P. M. S. Monk, R. J. Mortimer and D. R. Rosseinsky, Electrochromism: Fundamentals and Applications, p. 3, VCH, Weinheim (1995).
C. G. Granqvist, Handbook of Inorganic Electrochromic Materials, p. 1, Elsevier, Amsterdam, (1995).
S. -H. Lee, W. Gao, C. E. Tracy, H. M. Branz, D. K. Benson and S. Deb, J. Electrochem. Soc., 145, 3545 (1998).

상세보기
T. J. Richardson, J. L. Slack, R. D. Armitage, R. Kostecki, B. Farangis and M. D. Rubin, Appl. Phys. Lett., 78, 3047 (2001).

상세보기
R. J. Mortimer, A. L. Dyer and J. R. Reynolds, Displays, 27, 2 (2006).

상세보기
K. -W. Park, H. -S. Shim, T. -Y. Seong and Y. -E. Sung, Appl. Phys. Lett., 88, 211107 (2006).

상세보기
I. Porqueras, G. Viera, J. Marti and E. Bertran, Thin Solid Films, 343-344, 179 (1999).

상세보기
H. S. Withan, P. Chindaudom, I. An. R. W. Collins, R. Messier and K. Vedam, J. Vac. Sci. Tech. A, 11(4), 1881 (1993).

상세보기
A. Meulenkamp, J. Electrochem. Soc., 144, 1664 (1997).

상세보기
T. C. Arnoldussen, J. Electrochem. Soc., 128, 117 (1981).

상세보기
J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, p. 146-147 ed. J. Chastain and R. C. King, Jr., Physical Electronics, Minnesota, USA (1995).
J. Nagai, T. Kamimori and M. Mizuhashi, Proc. Soc. Photo Opt. Instrum. Eng., 562, 39 (1985)
P. Falaras, A. Hugot-Le Goff and S. Joiret, Large-area Chromogenics: Materials and Devices for Transmittance Control, p. 16, ed. C. Lampert and C. Granqvist, SPIE Opt. Bellingham (1990)
J. L. He and M. C. Chiu, Surf. Coating. Tech., 127, 43 (2000).

상세보기
S. H. Lee, H. M. Cheong, C. E. Tracy, A. Mascarenhas, A. W. Czanderna and S. K. Deb, Appl. Phys. Lett., 75, 1541 (1999).

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Effects of Sputter Parameters on Electrochromic Properties of Tungsten Oxide Thin Films Grown by RF Sputtering 원문보기

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Effects of Sputter Parameters on Electrochromic Properties of Tungsten Oxide Thin Films Grown by RF Sputtering 원문보기

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