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한국산업보건학회지 = Journal of Korean Society of Occupational and Environmental Hygiene, v.26 no.2, 2016년, pp.119 - 138
최광민 (삼성전자 건강연구소)
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Objectives: The purpose of this study is to review size, shape, and crystal structure-dependent toxicity of major metal oxide particles such as silicon dioxide, tungsten trioxide, aluminum oxide, and titanium dioxide as byproducts generated in semiconductor fabrication facility. Methods: To review t...
| 핵심어 | 질문 | 논문에서 추출한 답변 |
|---|---|---|
| Al2O3 입자는 반도체 작업 환경 중 어떠한 공정에서 주로 발생하는가? | Al2O3는 백색의 분말로서 육방정계(hexagonal system)의 결정구조를 가지며 IARC 및 ACGIH에서는 발암성 물질로 분류하고 있지 않다. 반도체 작업 환경에서는 ETCH 공정 및 METAL 공정에서 발생 가능성이 높은 것으로 확인되며 지금까지 보고된 Al2O3 입자의 독성을 Table 3에 정리하였다. | |
| SiO2가 신체에 미치는 영향은? | 사람의 기관지 상피 및 내피세포, 폐암종세포, 태아 신장세포 등에 독성을 나타내며, mouse 간독성, 급성염증 등이 발현되는데, 입경, 표면적 및 용량의존성을 가지며 특히 입경(100 nm 이하)이 생물학적 영향을 발현하는데 중요한 인자인 것으로 나타났다. 한편, 세포 종류 및 동물의 기관에 따라 SiO2 입자의 독성이 발현되지 않는다는 연구 사례도 확인되었다. | |
| 실리카의 결정구조에 따른 분류는? | 반도체 제조 작업환경 내 존재 가능한 가장 대표적인 입자상 부산물인 실리카(SiO2)는 결정구조에 따라 결정형(crystalline)과 비결정형(amorphous)으로 분류된다. 결정형 SiO2의 경우 흡입 시 발암성 및 만성적 폐질환을 일으키며, 전통적 공정에서의 비결정형 SiO2는 독성이 낮은 것으로 알려져 있다(Bhaskar et al. |
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