AI 본문요약

엑셀 다운로드 AI-Helper

* AI 자동 식별 결과로 적합하지 않은 문장이 있을 수 있으니, 이용에 유의하시기 바랍니다.

참고문헌 (16)

1. P. Boeuf, Ph. Belenguer, and T. Hbid, "Plasma par ticle interactions," Plasma Sources Science and Technology, vol. 3, pp. 407-417, 1994. 

   상세보기

2. D. M. Tanenbaum, A. L. Laracuente, and A. Gallagher, "Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition," Applied Physics Letters, vol. 68, no. 12, pp. 1705-1707, 1996. 

   상세보기

3. M. Shiratani, S. Maeda, K. Koga, and Y. Watanabe, "Effects of Gas Temperature Gradient, Pulse Discharge Modulation, and Hydrogen Dilution on Particle Growth in Silane RF Discharges," Japanes Journal of Applied Physics, vol. 39, no. 1, pp. 287-293. 

4. S. Nunomura, I. Yoshida, and M. Kondo, "Time-dependent gas phase kinetics in a hydrogen diluted silane plasma," Applied Physics Letter, vol. 94, no. 7, p. 071502, 2009. 

   상세보기

5. K. Koga, N. Kaguchi, M. Shiratani, and Y. Watanabe, "Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H2 bonds in the films," Journal of Vacuum Science & Technology A, vol. 22, no. 4, pp. 1536-1539, 2004. 

   상세보기

6. K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, "Highly stable a-Si:H films deposited by using multi-hollow plasma chemical vapor deposition," Japanese Journal of Applied Physics, vol. 44, no. 46-49, pp. L1430-L1432, 2005. 

   상세보기

7. Y. Kim, K. Hatozaki, Y. Hashimoto, G. Uchida, K. Kamataki, N. Itagaki, H. Seo, K. Koga, and M. Shiratani, "High amount cluster incorporation in initial Si film deposition by $SiH_4$ plasma chemical vapor deposition," Japanese Journal of Applied Physics, vol. 52, no. 1S, p. 01AD01, 2013. 

   상세보기

8. W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, and M. Shiratani, "High rate deposition of highly stable a-Si:H films using multi-hollow discharges for thin films solar cells," Surface Coatings Technology, vol. 205, pp. S241-S245, 2010. 

   상세보기

9. K. Koga, N. Kaguchi, K. Bando and M. Shiratani, "Cluster-eliminating filter for depositing cluster-free a-Si:H films by plasma chemical vapor deposition," Review of Scientific Instruments, vol. 76, no. 11, p. 113501 2005. 

   상세보기

10. H. Jia, J, K. Saha, N. Ohse, and H. Shirai, "High-rate synthesis of microcrystalline silicon films using high-density $SiH_4/H_2$ microwave plasma," Thin Solid Films, vol. 515, no. 17, pp. 6713-6720, 2007. 

    상세보기

11. G. Sauerbrey, "Verwendung von Schwingquarzen zur Wagung dunner Schichten und zur Mikrowagung," Zeitschrift Fur Physik, vol. 155, no. 2, pp. 206-222, 1959. 

    상세보기

12. J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, and J. Guillon, "Surface reaction probabilities and kinetics of H, $SiH_3$ , $Si_2H_5$ , $CH_3$ , and $C_2H_5$ during deposition of a-Si:H and a-C:H from $H_2$ , $SiH_4$ , and $CH_4$ discharges," Journal of Vacuum Science & Technology A, vol. 166, no. 1, pp. 278-289, 1998. 

13. Y. Watanabe, M. Shiratani, and K. Koga, "Clustering phenomena in low-pressure reactive plasmas. Basis and applications," Pure Applied Chemistry, vol. 74, no. 3, pp. 483-487, 2002. 

    상세보기

14. Y. Watanabe, "Formation and behaviour of nano/micro-particles in low pressure plasmas," Journal of Physics D: Applied Physics, vol. 39, no. 19, pp. R329-R361, 2006. 

    상세보기

15. F. J. Kampas and R. W. Griffith, "Optical emission spectroscopy: Toward the identification of species in the plasma deposition of hydrogenated amorphous silicon alloys," Solar Cells, vol. 2, no. 4, pp. 385-400, 1980. 

    상세보기

16. B. Drevillon, J. Hue, A. Lloret, J. Perrin, G. de Rosny, and J. P. M. Schmitt, "Silane dissociation mechanisms and thin film formation in a low pressure multipole dc discharge," Applied physics letters, vol. 37, no. 7, pp. 646-648, 1980. 

    상세보기

저자의 다른 논문 :

강준 (5)