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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.19 no.4, 2020년, pp.28 - 33
이은영 (한국기술교육대학교 메카트로닉스공학과) , 김문기 (한국기술교육대학교 메카트로닉스공학부)
Plasma etching process employs high density plasma to create surface chemistry and physical reactions, by which to remove material. Plasma chamber includes silicon-based materials such as a focus ring and gas distribution plate. Focus ring needs to be replaced after a short period. For this reason, ...
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