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NTIS 바로가기반도체디스플레이기술학회지 = Journal of the semiconductor & display technology, v.21 no.2, 2022년, pp.144 - 149
이천규 (한국생산기술연구원 청정기술연구소 탄소중립산업기술연구부문) , 김진만 (한국생산기술연구원 청정기술연구소 탄소중립산업기술연구부문) , 이정길 (한국생산기술연구원 청정기술연구소 탄소중립산업기술연구부문)
A cryogenic Mixed Refrigerant Joule-Thomson refrigeration cycle was designed to be applied to the semiconductor etching process with non-flammable constituents. 3-stage cascade refrigerator, single mixed refrigerant Joule-Thomson refrigerator, and 2-stage cascade type mixed refrigerant Joule-Thomson...
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Rezvanov, A., Miakonkikh, A. V., Vishnevskiy, A. S., Rudenko, K. V., Baklanov, M. R., "Cryogenic etching of porous low-k dielectrics in CF3BR and CF4 plasmas", J. Vac. Sci. Technol. B, Vo. 35, pp. 021204, 2017.
Du, H.C. and Hong, S. J., "Temperature Analysis of Electrostatic Chuck for Cryogenic Etch Equipment", Journal of the Semiconductor & Display Technology, Vol. 20, No. 2, pp. 19-24, 2021.
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