[논문]질화포텐셜 제어 가스질화로 개발(I) : 제어질화 및 국내 기술 현황

이원범; 손석원

doi:10.12656/jksht.2023.36.1.40

질화포텐셜 제어 가스질화로 개발(I) : 제어질화 및 국내 기술 현황
Development of Controlled Gas Nitriding Furnace : Controlled Gas Nitriding Technology and Present Situation in Korea 원문보기

열처리공학회지 = Journal of the Korean society for heat treatment, v.36 no.1, 2023년, pp.40 - 46

이원범 (한국생산기술연구원 친환경열표면처리연구부문) , 손석원 (한국생산기술연구원 친환경열표면처리연구부문)

Abstract ▼ AI-Helper

Controlled nitriding is a technology that controls the nitriding potential based on the gas partial pressure received through an IOT-based sensor. Controlled nitriding is characterized by easy control of the phase of the nitride compound and excellent reproducibility of quality. In particular, it is possible to form a compound layer of excellent quality with fewer pores on the surface. However, despite these advantages, the application of controlled nitriding still needs to be improved in Korea. This paper explains the characteristics of controlled nitriding and describes the future direction and the problems of controlled nitriding in Korea.

주제어

표/그림 (8)

그림 Fig. 1. Stages of Smart Factory.
그림 Fig. 2. Schematic diagram of controlled nitriding furnace: Controlled nitriding furnace refers to a system in which an H₂ sensor is installed in a general nitriding furnace as an IOT concept and Kn is controlled through the value.
그림 Fig. 3. Concept of phase control of conventional gas nitriding and controlled nitriding; (a) general microstructure of nitriding, (b) growth of compounds layer formed in conventional nitriding, (c) growth and control of phase through controlled nitriding
그림 Fig. 4. Schematic diagram of phase control and hardening depth of conventional gas nitriding and controlled nitriding; (a) Compound depth and hardening depth formed in conventional nitriding, (b) Changes in layer thickness and hardening depth formed through controlled nitriding.
그림 Fig. 5. Quality change according to the amount of product in conventional gas nitriding and controlled nitriding; (a) Variation with the amount of product in conventional nitriding, (b) Variation with the amount of product in controlled nitriding.
그림 Fig. 6. The range of nitriding potential recommended in AMS on various materials [14].
그림 Fig. 7. A nitrided compound in which pores are minimized through controlled nitriding; (a) SPCC, (b) SCM415, (c) SCM440.
그림 Fig. 8. A key item of a multi-speed transmission parts applied with controlled nitriding. It is necessary to minimize the formation of ε phase and the porous layer through compound control.

참고문헌 (15)

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