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NTIS 바로가기전기전자재료학회논문지 = Journal of the Korean institute of electronic material engineers, v.36 no.2, 2023년, pp.109 - 124
김상모 (세종대학교 지능기전공학과) , 김경환 (가천대학교 전기공학과)
For decades, sputtering as a physical vapor deposition (PVD) method has been a widely used technique for film coating processes. The sputtering enables oxides, metals, alloys, nitrides, etc to be deposited on a wide variety of substrates from silicon wafers to polymer substrates. Meanwhile, transpar...
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