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NTIS 바로가기Journal of sensor science and technology = 센서학회지, v.32 no.5, 2023년, pp.328 - 333
김차영 (한국생산기술연구원 첨단메카트로닉스 연구그룹) , 노은식 (한국생산기술연구원 첨단메카트로닉스 연구그룹) , 신금재 (한국생산기술연구원 첨단메카트로닉스 연구그룹) , 문원규 (포항공과대학교 기계공학과)
This study experimentally verified the etch rate of the SiO2 sacrificial layer etching process with a single etch hole using vapor-phase hydrogen fluoride (VHF) etching. To fabricate small-sized polysilicon etch holes, both circular and triangular pattern masks were employed. Etch holes were fabrica...
S. Shubham, Y. Seo, V. Naderyan, X. Song, A. J. Frank, J.?T. M. G. Johnson, M. da Silva, and M. Pedersen, "A Novel?MEMS Capacitive Microphone with Semiconstrained Diaphragm Supported with Center and Peripheral Backplate?Protrusions," Micromachines, Vol. 13, No. 1, p. 22(1)-22(23), 2021.
J. Varona, M. Tecpoyotl-Torres, and A. Hamoui, "Design of?MEMS vertical-horizontal chevron thermal actuators",?Sens. Actuators A Phys., Vol. 153, No. 1, pp. 127-130, 2009.
Y. Qiu, J. V. Gigliotti, M. Wallace, F. Griggio, C. E. M.?Demore, S. Cochran, and S. Trolier-McKinstry, "Piezoelectric micromachined ultrasound transducer (PMUT)?arrays for integrated sensing, actuation and imaging", Sens.,?Vol. 15, No. 4, pp. 8020-8041, 2015.
N. Moldovan, K. H. Kim, and H. D. Espinosa, "Design and?Fabrication of a Novel Microfluidic Nanoprobe", J. Microelectromech. Syst., Vol. 15, No. 1, pp. 204-213, 2006.
J. A. Walker, K. J. Gabriel, and M. Mehregany, "Mechanical integrity of polysilicon films exposed to hydrofluoric?acid solutions", Proc. of IEEE Proceedings on Micro Electro Mech. Syst., An Investigation of Micro Structures, Sensors, Actuators, Machines and Robots., pp. 56-60, Napa?Valley, USA, 1990.
W. I. Jang, C. A. Choi, M. L. Lee, C. H. Jun, and Y. T. Kim,?"Fabrication of MEMS devices by using anhydrous HF gas-phase etching with alcoholic vapor", J. Micromech. Microeng., Vol. 12, No. 3, pp. 297-306, 2002.
D. J. Monk, D. S. Soane, and R. T. Howe, "Hydrofluoric?Acid Etching of Silicon Dioxide Sacrificial Layers: I.?Experimental Observations", J. Electrochem. Soc., Vol. 141,?No. 1, p. 264, 1994.
F. Xianwen, M. Nosang, K. Nobe, and J. W. Judy, "Modeling the effect of etch holes on ferromagnetic MEMS",?IEEE Trans. Magn., Vol. 37, No. 4, pp. 2637-2639, 2001.
V. L. Rabinovich, R. K. Gupta, and S. D. Senturia, "The?effect of release-etch holes on the electromechanical?behaviour of MEMS structures", Proc. of International?Solid State Sensors and Actuators Conference (Transducers?'97), pp. 1125-1128, Chicago, USA, 1997.
D. J. Monk, D. S. Soane, and R. T. Howe, "Hydrofluoric?Acid Etching of Silicon Dioxide Sacrificial Layers: II. Modeling", J. Electrochem. Soc., Vol. 141, No. 1, p. 270, 1994.
J. Zhang, Y. Wu, G. Yang, D. Chen, J. Zhang, H. You, C.?Zhang, and Y. Hao, "Optimization of Sacrificial Layer Etching in Single-Crystal Silicon Nano-Films Transfer Printing for Heterogeneous Integration Application", Nanomater.,?Vol. 11, No. 11, pp. 3085(1)-3085(12), 2021.
L. Louriki, P. Staffeld, A. Kaelberer, and T. Otto, "Silicon?Sacrificial Layer Technology for the Production of 3D?MEMS (EPyC Process)", Proc. of Eurosensors 2017 Conference, pp. 295(1)-295(5), Paris, France, 2017.
https://www.idonus.com/index.php?pathproducts&categoryVPE (retrieved on Sep. 4, 2023).
J. Buhler, F. P. Steiner, and H. Baltes, "Silicon dioxide sacrificial layer etching in surface micromachining", J. Micromech. Microeng., Vol. 7, No. 1, p. R1, 1997.
A. Witvrouw, B. Du Bois, P. De Moor, A. Verbist, C. A.?Van Hoof, H. Bender, and C. Baert, "Comparison between?wet HF etching and vapor HF etching for sacrificial oxide?removal", SPIE, Vol. 4174, pp. 130-141, 2000.
Y. I. Lee, K. H. Park, J. Lee, C. S. Lee, H. J. Yoo, C. J. Kim,?and Y. S. Yoon, "Dry release for surface micromachining?with HF vapor-phase etching", J. Microelectromech. Syst.,?Vol. 6, No. 3, pp. 226-233, 1997.
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