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NTIS 바로가기전기전자재료학회논문지 = Journal of the Korean Institute of Electrical and Electronic Material Engineers, v.37 no.2, 2024년, pp.188 - 194
Yebin Ahn (Department of Chemical Engineering, Kangwon National University) , Jongchul Lee (Department of Chemical Engineering, Kangwon National University) , Hanseok Kwon (Department of Chemical Engineering, Kangwon National University) , Jungbin Hong (Department of Chemical Engineering, Kangwon National University) , Han-Don Um (Department of Chemical Engineering, Kangwon National University)
This paper introduces an optimized oxygen (O2) plasma surface treatment technique to enhance sphere lithography on hydrophobic photoresist surfaces. The focus is on semiconductor manufacturing, particularly the creation of finer structures beyond the capabilities of traditional photolithography. The...
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