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Ozone: science & engineering, v.24 no.5, 2002년, pp.391 - 398
Vankerckhoven, H. (Department of Chemistry, Leuven, Belgium) , De Smedt, F. (Department of Chemistry, Leuven, Belgium) , Van Herp, B. (Department of Chemistry, Leuven, Belgium) , Claes, M. , De Gendt, S. , Heyns, M. M. , Vinckier, C.
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Mainly because of cost-saving and environmental concerns, ozone has been introduced as a cleaning agent in semiconductor manufacturing in recent years. This work reports the determination of the most important degradation products formed after the stripping of two different types of photoresist (PR...
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