[논문]Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity

Padmanaban, Munirathna; Anyadiegwu, Clement; Kanda, Takashi; Kim, Woo-Kyu; Kudo, Takanori; McKenzie, Douglas; Rahman, Dalil; Dammel, Ralph; Lee, SangHo

doi:10.2494/photopolymer.16.475

[해외논문] Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity 원문보기

フォトポリマ-懇話會誌= Journal of photopolymer science and technology, v.16 no.4, 2003년, pp.475 - 481

Padmanaban, Munirathna (AZ Electronic Materials, Clariant Corporation) , Anyadiegwu, Clement (AZ Electronic Materials, Clariant Corporation) , Kanda, Takashi (AZ Electronic Materials, Clariant Corporation) , Kim, Woo-Kyu (AZ Electronic Materials, Clariant Corporation) , Kudo, Takanori (AZ Electronic Materials, Clariant Corporation) , McKenzie, Douglas (AZ Electronic Materials, Clariant Corporation) , Rahman, Dalil (AZ Electronic Materials, Clariant Corporation) , Dammel, Ralph (AZ Electronic Materials, Clariant Corporation) , Lee, SangHo (AZ Electronic Materials, Clariant Corporation)

Abstract ▼ AI-Helper

Control of the critical dimension (CD) during photo lithographic process is becoming more and more critical as the CD size decreases and wafer size increases. Among other factors, PEB (post-exposure bake) sensitivity [ΔCD(nm) /ΔTemp(°C)] of photoresists plays an important role in achieving uniform CD. ArF resists are the preferred materials for the critical layers in the 90 and 65 nm nodes where in the CDs are less than 100 nm. The influence of resist components such as type of PAG, solvent, and blocking ratio as well as the processing conditions were investigated in the ArF resist formulations. It was observed that almost all the resist components influence the PEB sensitivity. Use of bulky and long chain sulfonic acids such as perfluorooctane sulfonic acid, low blocking ratio and low boiling solvents reduce the PEB sensitivity but at the expense of other resist properties such as resolution and line-edge roughness (LER). As expected the cation type of the photoacid generators (PAGs) did not show any effect on the PEB sensitivity. On the processing side, lowering PEB temperature and increasing soft bake (SB) temperature help improve the PEB sensitivity but the LER becomes worse. Results of these studies along with the performance of some of the optimized ArF formulations are presented.

주제어

참고문헌 (15)

Proc. SPIE M. Padmanaban, E. Alemy, R.R. Damme 4690 606 2002 10.1117/12.474262
Proc. SPIE J.P. Simons, D.L. Goldfarb, M. Ange 4345 19 2001 10.1117/12.436855
10.1117/12.485146 3) C.M. Jones, C. Kallingal, M. Zawadzki, N. Jeewakhan, N. Kaviani, P. Krishnan, A. Klaum, J.V. Ess., Proc. SPIE., Vol5039, 2003 (in press)
Proc. SPIE Q. Lin, D.L. Goldfarb, M. Angelopou 4345 606 2001
5) S.H. Lee, W.K. Kim, D. Rahman, T. Kudo, A. Timko, C. Anyadiegwu, D. McKenzie, T. Kanda, R. Dammel, and M. Padmanaban., ., Proc. SPIE., Vol5039 (2003) in press.
Proc. SPIE A. Hisai, K. Kaneyama 4690 754 2002 10.1117/12.474276
Polym. Mater. Sci. Eng. DAMMEL R R 81 33 1999
0914-9244 J. Photopolym. Sci. Technol. PADMANABAN M 13 4 607 2000 10.2494/photopolymer.13.607

상세보기
Proc. SPIE M.D. Rahman, D. McKenzie, J.B. Bae, 4345 159 2001 10.1117/12.436845
Proc. SPIE T. Kudo, J.B. Bae, R.R. Dammel, W.K 4345 179 2001 10.1117/12.436847
Proc. SPIE M.D. Rahman, W. Conley, D. Miller, 4690 127 2002 10.1117/12.474210
10.1117/12.487738 12. M. Padmanaban, R. Dammel, S.H. Lee, W.K. Kim, T. Kudo, D. McKenzie, D. Rahman., Proc. SPIE., Vol5039 (2003) in press.
Proc. SPIE Y. Hsiao, T. Liu, L. Chiu, C. Chen, 4690 712 2002 10.1117/12.474271
Proc. SPIE K. Lederer, S. Hornig, and R. Schus 4690 883 2002 10.1117/12.474162
Proc. SPIE G. Pohlers, Y. Suzuki, N. Chan, and 4690 178 2002 10.1117/12.474217

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 논문명, 저널/프로시딩명, 저자 , 발행년, 권, 호, 시작페이지, 끝페이지, 발행기관 관리번호, 논문명, 대등논문명, 저자 , 저널/프로시딩명, 발행기관, 발행년, 발행언어, 권, 호, 시작페이지, 끝페이지, ISBN, ISSN, 주제분야, 키워드, 초록(한글), 초록(영문), 저자(소속기관)
저장형식	Text(ASCII format) Excel format RefWorks Direct Export RIS format (for Reference Manager, ProCite, EndNote), Scholar's Aids, Mendeley
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

[해외논문] Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity 원문보기

Abstract ▼ AI-Helper

주제어

참고문헌 (15)

이 논문을 인용한 문헌

관련 콘텐츠

원문 보기

원문 URL 링크

오픈액세스(OA) 유형

이 논문과 함께 이용한 콘텐츠

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트