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NTIS 바로가기Journal of the Electrochemical Society : JES, v.151 no.10, 2004년, pp.G658 -
Suphantharida, Preuchsuda , Osseo-Asare, Kwadwo
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Glass Ind. Duncan 41 412 1960
1091-0344 Mach. Sci. Technol. Sabia 4 235 2000 10.1080/10940340008945708
0022-2461 J. Mater. Sci. Janos 26 4062 1991 10.1007/BF02402947
0196-6219 Ceram. Eng. Sci. Proc. Zagari 16 302 1995 10.1002/9780470314708.ch51
0038-1101 Solid-State Electron. Homma 41 1005 1997 10.1016/S0038-1101(97)00014-2
0022-3093 J. Non-Cryst. Solids Hoshino 283 129 2001 10.1016/S0022-3093(01)00364-7
W. G. America, R. Srinivasan, and S. V. Babu, in Chemical-Mechanical Polishing: Fundamentals and Challenges , S. V. Babu, S. Danyluk, M. Krishnan, and M. Tsujimura, Editors, p. 13, The Materials Research Society Symposia Proceedings Series, Vol. 566, Warrendale, PA (2000).
10.1557/PROC-671-M5.3 J. H. Lee, B. U. Yoon, S. Hah, and J. T. Moon, in Chemical-Mechanical Polishing 2001-Advantages and Future Challenges , S. V. Babu, K. C. Cadien, J. G. Ryan, and H. Yano, Editors, The Materials Research Society Symposia Proceedings Series, Vol. 671, p. M.5.3.1, Warrendale, PA (2001).
0038-111X Solid State Technol. Tuyen 43 123 2000
T. Park, J. Y. Kim, K. W. Park, H. S. Lee, H. B. Shin, Y. H. Kim, M. H. Park, H. K. Kang, and M. Y. Lee, in Proceedings of the 1999 Symposium on VLSI Technology , p. 159, Japan Society of Applied Physics, IEEE (1999).
A. Ro?mer, T. Donohue, J. Gagliardi, F. Weimar, P. Thieme, and M. Hollatz, in Proceedings of the 5th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) , p. 265, The Institute of Microelectronics Interconnection, Tampa, FL (2000).
L. Peng and C. Yi, in Proceedings of the 4th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) , p. 354, The Institute of Microelectronics Interconnection, Tampa, FL (1999).
0374-4884 J. Korean Phys. Soc. Kim 39 S197 2001 10.3938/jkps.39.S518
10.1557/PROC-671-M4.1 A. Simpson, L. Economikos, F.-F. Jamin, and A. Ticknor, in Chemical-Mechanical, Polishing 2001-Advances and Future Challenges , S. V. Babu, K. C. Cadien, and H. Yano, Editors, p. M4.1.1, The Materials Research Society Symposia Proceedings Series, Vol. 671, Warrendale, PA (2001).
J. A. Schlueter, I. Kim, and F. J. Krupa, in Proceedings of the 4th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) , p. 336, The Institute of Microelectronics Interconnection, Tampa, FL (1999).
J. Boyd, T. Buley, R. Kistler, D. Wei, and M. Pevny, in Proceedings of the 6th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) , p. 563, The Institute of Microelectronics Interconnection, Tampa, FL (2001).
10.1145/2931127.2931135 J. Gagliardi, R. Webb, C. Rueb, G. Menk, P. McReynolds, G. Prabhu, and T. Osterheld, in Proceedings of the 7th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference (CMP-MIC) , p. 274, The Institute of Microelectronics Interconnection, Tampa, FL (2002).
M. R. Oliver, in Chemical-Mechanical Polishing Fundamentals and Challenges , S. V. Babu, S. Danyluk, M. Krishnan, and M. Tsujimura, Editors, The Materials Research Society Symposia Proceedings Series, Vol. 566, p. 73, Warrendale, PA (2000).
0017-1050 Glass Technol. Kelsall 39 6 1998
0017-1050 Glass Technol. Isumitani 12 131 1971
0141-6359 Precis. Eng. Brown 9 129 1987 10.1016/0141-6359(87)90030-4
Glass Ind. Silvernail 52 130 1971
0022-3093 J. Non-Cryst. Solids Cook 120 152 1990 10.1016/0022-3093(90)90200-6
0040-6090 Thin Solid Films Rajan 308-309 529 1997 10.1016/S0040-6090(97)00501-4
K. Osseo-Asare and A. Khan, in Chemical Mechanical Planarization in Integrated Circuit Device Manufacturing , S. Raghavan, R. L. Opila, and L. Zhang, Editors, PV 98-7, p. 139, The Electrochemical Society Proceedings Series, Pennington, NJ (1998).
K. Osseo-Asare and P. Suphantharida, in Chemical Mechanical Polishing IV , R. L. Opila, C. Reidsema-Simpson, K. B. Sundaram, and S. Seal, Editors, PV 2000-26, p. 222, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).
P. Suphantharida and K. Osseo-Asare, in Chemical Mechanical Planarization V , S. Seal, R. L. Opila, C. Reidsema-Simpson, K. B. Sundaram, H. Huff, and I. I. Suni, Editors, PV 2002-1, p. 222, The Electrochemical Society Proceedings Series, Pennington, NJ (2002).
R. J. Hunter, Zeta Potential in Colloid Science: Principles and Applications , Academic Press, New York (1981).
0022-2461 J. Mater. Sci. Hackley 29 4220 1994 10.1007/BF00376264
Indian J. Chem. Ray 17A 348 1979
J. Soil Sci. Matson 38 229 1934
0009-2665 Chem. Rev. (Washington, D.C.) Parks 65 177 1965 10.1021/cr60234a002
J. G. Park, S.-H. Lee, and H.-G. Kim, in Chemical-Mechanical Polishing Fundamentals and Challenges , S. V. Babu, S. Danyluk, M. Krishnan, and M. Tsujimura, Editors, The Materials Research Society Symposia Proceedings Series, Vol. 566, p. 173, Warrendale, PA (2000).
Tech. Dig. Series Cumbo 13 134 1994
G. A. Parks, in Mineral-Water Interface Geochemistry, Reviews in Mineralogy , Vol. 23, M. F. Hochella, Jr. and A. F. White, Editors, p. 133, The Mineralogical Society of America, Washington, DC (1990).
0021-9797 J. Colloid Interface Sci. Anderson 54 391 1976 10.1016/0021-9797(76)90318-0
0028-0836 Nature (London) Hingston 215 1459 1967 10.1038/2151459a0
Search Hingston 1 324 1970
J. Soil. Sci. Hingston 23 177 1972 10.1111/j.1365-2389.1972.tb01652.x
0166-6622 Colloids Surf. Sigg 2 101 1981 10.1016/0166-6622(81)80001-7
0361-5995 Soil Sci. Soc. Am. J. Goldberg 52 87 1988 10.2136/sssaj1988.03615995005200010015x
0004-9573 Austral. J. Soil Res. Hingston 5 295 1967 10.1071/SR9670295
J. R. Batista, Ph.D. Thesis, The Pennsylvania State University, University Park, PA (1995).
B. M. Shukla and R. S. Tripathi, in Proceedings of the 1st Chemical Symposium , p. 95, Chemistry and Metallurgy Communication of the Department of Atomic Energy, Bombay, India (1970).
0022-2461 J. Mater. Sci. Cabot 33 3945 1998 10.1023/A:1004692611926
J. P. Gustafsson, Visual MINTEQ V.2.02 (Windows version of MINTEQA V.4.0 by USEPA), A Geochemical Assessment Model for Environmental Systems , Royal Institute of Technology, Sweden (2002).
P. M. Dove and J. D. Rimstidt, in Silica: Physical Behavior, Geochemistry and Materials Applications, Reviews in Mineralogy , Vol. 29, P. J. Heaney, C. T. Prewitt, and G. V. Gibbs, Editors, p. 259, The Mineralogical Society of America, Washington, DC (1994).
0956-5000 J. Chem. Soc., Faraday Trans. House 88 233 1992 10.1039/FT9928800233
0013-4651 J. Electrochem. Soc. Osseo-Asare 149 G651 2002 10.1149/1.1516777
P. Suphantharida and K. Osseo-Asare, In preparation.
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