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NTIS 바로가기液晶與顯示 = Chinese journal of liquid crystals and displays, v.23 no.2, 2008년, pp.183 - 187
LIU, Xiang (Key Labaratory of Luminescence and Optical Information ,Ministry of Education,Institute of Optoelectranics Technology,Beijing Jiaotong University) , WANG, Zhangtao (Beijing BOE Optoelectronics Technology Co.LtD) , CHOI, Sangun (Beijing BOE Optoelectronics Technology Co.LtD) , DENG, Zhenbo (Key Labaratory of Luminescence and Optical Information ,Ministry of Education,Institute of Optoelectranics Technology,Beijing Jiaotong University) , QIU, Haijun (Beijing BOE Optoelectronics Technology Co.LtD)
Ashing process of photoresist (PR) is one of key steps in the Thin Film-Transistor four-mask fabrication process. PR ashing process with pure O_2 were investigated in this article. There are three main factors that influence on the photoresist ashing process, including power, pressure and gas flow. ...
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