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Nanoscale research letters, v.5 no.1, 2010년, pp.116 - 123
Wu, Wei (Key Laboratory of Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, 430072, Wuhan, People’s Republic of China) , Xiao, Xiangheng (Center for Electronic Microscopy and Department of Physics, Wuhan University, 430072, Wuhan, People’s Republic of China) , Zhang, Shaofeng (Center for Electronic Microscopy and Department of Physics, Wuhan University, 430072, Wuhan, People’s Republic of China) , Fan, Lixia (School of Materials and Metallurgy, Wuhan University of Science and Technology, 430081, Wuhan, People’s Republic of China) , Peng, Tangchao (Center for Electronic Microscopy and Department of Physics, Wuhan University, 430072, Wuhan, People’s Republic of China) , Ren, Feng (Center for Electronic Microscopy and Department of Physics, Wuhan University, 430072, Wuhan, People’s Republic of China) , Jiang, Changzhong (Key Laboratory of Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, 430072, Wuhan, People’s Republic of China)
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The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a facial route to synthesis ultrafine holl...
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