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NTIS 바로가기Optics and laser technology, v.42 no.6, 2010년, pp.902 - 910
Liu, C.Y. (Center for Measurement Standards, Industrial Technology Research Institute, Hsinchu, Taiwan) , Liu, T.A. , Fu, W.E.
Measurements of the diameter and size distribution of nanoparticles on wafers are critical parameters in the semiconductor industry, essential to control transistor quality and increase production rate. A goniometric optical scatter instrument (GOSI) has been developed that employs polarized light s...
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