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NTIS 바로가기Scanning : the journal of scanning microscopies, v.32 no.6, 2010년, pp.351 - 360
Yang, Ching‐Been , Chiang, Hsiu‐Lu , Huang, Jen‐Ching
AbstractAt present, applying a near‐field optical microscope to photolithographic line segment fabrication can only obtain nanoscale line segments of equal cutting depths, and cannot result in 3D shape fabrication. This study proposes an innovative line segment fabrication model of nearȁ...
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