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NTIS 바로가기電氣學會論文誌. IEEJ Transactions on Electronics, Information and Systems. C : 電子·情報·システム, v.126 no.6, 2006년, pp.676 - 682
Nishiyama, Iwao
The EUV lithography (EUVL) utilizes 13-nm photons as a light source. Because of the short wavelength, it provides a very high resolution and is applicable to the fabrication of multiple generations of semiconductor devices from 45 nm hp down to 32 and even 22 nm hp. This makes EUVL the most promisin...
信?論C 西山岩男·小川太?·岡崎信 84 1162 2001
(2) D. Attwood : Soft X-ray and extreme ultraviolet radiation principles and applications, Cambridge Univ. Press.
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