다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기
Vacuum, v.86 no.4, 2011년, pp.403 - 408
Woo, J.C. (School of Electrical and Electronics Engineering, Chung-Ang University, 221 Heukseok-Dong, Dongjak-Gu, Seoul 156-756, Republic of Korea) , Kim, S.H. (School of Electrical and Electronics Engineering, Chung-Ang University, 221 Heukseok-Dong, Dongjak-Gu, Seoul 156-756, Republic of Korea) , Kim, C.I.
AI-Helper
In this study, we carried out an investigation in the etching characteristics of TiN thin films in a C12/Ar adaptive coupled plasma. The maximum etch rate of the TiN thin films was 768 nm/min at a gas mixing ratio of C12 (75%)/Ar (25%). At the same time, the etch rate was measured as fun...
J Vac Sci Technol B Tonotani 21 2163 2003 10.1116/1.1612517
J Vac Sci Technol B Darnon 24 2262 2006 10.1116/1.2338048
J Vac Sci Technol B Le Gouil 25 767 2007 10.1116/1.2732736
IEEE Electron Device Lett Kim 18 465 1997 10.1109/55.624911
IEEE Electron Device Lett Park 19 441 1998 10.1109/55.728906
Appl Surf Sci Ehrke 231-232 598 2004 10.1016/j.apsusc.2004.03.120
Mater Sci Eng B Gaboriaud 109 34 2004 10.1016/j.mseb.2003.10.023
Thin Solid Films Kim 472 26 2005 10.1016/j.tsf.2004.05.128
J Korean Phys Soc Jeong 47 S401 2005
IEEE Tran Elec Device Cheng 46 1537 1999 10.1109/16.772508
Lee DH, Oh YK, Kim NH. Proceedings of the 5th International Conference on Microelectronics and interface. 2004 March 1-3. Santa Clara, CA, USA: 2004. pp. 177-178.
Chung WU, Oh SR, You JH, Lim KT, Oh YK, Kim NH. Proceedings of 13th Korean Conference on Semiconductor. 2006 Feb 23-24. Jeju, Korea: 2006. pp. 909-910.
Kim NH, inventor: APTC Co, assignee. Adaptively coupled plasma source having uniform magnetic field distribution and plasma chamber having the same. United State Patent US2009015635. 2009 Jun 18.
Song YS, Oh SR, Kim SG, Kim NH. inventor: APTC Co, assignee. Plasma etching method for obtaining high selectivity in using low plasma source. Koraea Patent KR10-55764 (Korean). 2006 March 10.
J Vac Sci Technol A Kim 19 2642 2001 10.1116/1.1399323
Appl Surf Sci Bertoti 84 357 1995 10.1016/0169-4332(94)00545-1
J Appl Phys d’Agostino 72 4351 1992 10.1063/1.352199
Thermochim Acta Fan 413 87 2004 10.1016/j.tca.2003.12.025
Physica B Jiang 352 118 2004 10.1016/j.physb.2004.07.001
Jpn J Appl Phys Matsuki 46 L1219 2007 10.1143/JJAP.46.L1219
Radiat Phys Chem Prumper 75 2019 2006 10.1016/j.radphyschem.2005.11.020
*원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다.
Copyright KISTI. All Rights Reserved.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.