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Thin solid films, v.528, 2013년, pp.42 - 48
Rafaja, D. , Kostenbauer, H. , Muhle, U. , Loffler, C. , Schreiber, G. , Kathrein, M. , Winkler, J.
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The effect of point defects, dislocations and grain boundaries on the electron scattering in molybdenum thin films having a constant thickness of 500nm was described quantitatively in form of a dependence of the electrical resistivity on the concentration of impurity atoms, stress-free lattice param...
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