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NTIS 바로가기Plasma sources science & technology, v.22 no.3, 2013년, pp.032002 -
Lee, Hee-Jin , Lee, Hyo-Chang , Kim, Young-Cheol , Chung, Chin-Wook
With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered...
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