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IEEE transactions on computer-aided design of integrated circuits and systems : a publication of the IEEE Circuits and Systems Society, v.32 no.8, 2013년, pp.1228 - 1239
Zigang Xiao (Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA) , Yuelin Du (Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA) , Hongbo Zhang (Synopsys Inc., Hillsboro, OR, USA) , Wong, Martin D. F. (Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA)
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Double patterning lithography (DPL) technologies have become a must for today's sub-32 nm technology nodes. Currently, there are two leading DPL technologies: self-aligned double patterning (SADP) and litho-etch-litho-etch (LELE). Among them, SADP has the significant advantage over LELE in its abili...
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