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Antireflective ultra-fast nanoscale texturing for efficient multi-crystalline silicon solar cells

Solar energy, v.115, 2015년, pp.656 - 666  

Srivastava, Sanjay K. (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Singh, Prashant (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Yameen, Mohammad (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Prathap, P. (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Rauthan, C.M.S. (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Vandana, C.M.S. (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India) ,  Singh, P.K. (Silicon Solar Cells Group, CSIR-National Physical Laboratory, New Delhi 110012, India)

Abstract AI-Helper 아이콘AI-Helper

Abstract Minimization of reflection losses is extremely important for efficient silicon solar cells made either on mono crystalline (c-) or multi-crystalline (mc-) silicon (Si) substrates. A simple and fast etching process yet effective for nano-scale texturing of mc-Si surface using silver assiste...

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