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NTIS 바로가기Journal of materials chemistry. C, Materials for optical and electronic devices, v.4 no.44, 2016년, pp.10486 - 10493
Seul, Hyeon Joo (Department of Electronic Engineering) , Kim, Hyun-Gwan (Research Center for Nano-Materials) , Park, Man-Young (Research Center for Nano-Materials) , Jeong, Jae Kyeong (Department of Electronic Engineering)
A facile route for the preparation of a solution-processed silicon oxide dielectric from perhydropolysilazane (PHPS) at a low temperature (≤150 °C) is proposed. Deep ultraviolet (DUV) irradiation on the PHPS-derived silicon oxide film, where the coupling agent of vinyltriethoxysilane (VTES) w...
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