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[해외논문] Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition
Organic electronics, v.50, 2017년, pp.296 - 303
Kim, Lae Ho (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , Jang, Jin Hyuk (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , Jeong, Yong Jin (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , Kim, Kyunghun (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , Baek, Yonghwa (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , Kwon, Hyeok-jin (Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea) , An, Tae Kyu (Department of Polymer Science & Engineering and Department of IT Convergence, Korea National University of Transportation, Chungju, 2746) , Nam, Sooji , Kim, Se Hyun , Jang, Jaeyoung , Park, Chan Eon
Abstract
AI-Helper
Polymer substrates are essential components of flexible electronic applications such as OTFTs, OPVs, and OLEDs. However, high water vapor permeability of polymer films can significantly reduce the lifetime of flexible electronic devices. In this study, we examined the water vapor permeation barrier ...
Keyword
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