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Materials today: proceedings, v.4 no.9, 2017년, pp.10309 - 10314
Pulla Reddy, A. , Sreenivasulu, G. , Veerabadra Chary, R.
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SRAM cell stability is the primary concern for future technologies due to process variations like threshold voltage and supply voltage scaling etc. The increased effect of process variation and increase in parasitic resistance and capacitance in Nano scale technologies, the lower supply voltages, co...
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