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Precision engineering, v.55, 2019년, pp.137 - 143
Ginestra, P.S. (Dept. of Mechanical and Industrial Engineering, University of Brescia) , Madou, M. (Dept. of Mechanical and Aerospace Engineering, University of California S3231 Engineering Gateway Mail Code: 3975) , Ceretti, E. (Dept. of Mechanical and Industrial Engineering, University of Brescia)
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Abstract The preparation of carbon micro-patterns is reported in this paper. Different carbon micro-patterns were created using photolithography of the epoxy-based negative photoresist SU-8. Photoresist patterns were optimized in terms of resolution and aspect ratio and subsequently subjected to py...
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