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NTIS 바로가기Applied surface science, v.505, 2020년, pp.144615 -
Lee, Moonsang (Research Center for Materials Analysis, Korea Basic Science Institute) , Yang, Mino (Seoul Center, Korea Basic Science Institute Seoul) , Lee, Hae-Yong (LumiGNtech Co. Ltd.) , Lee, Hyun Uk (Research Center for Materials Analysis, Korea Basic Science Institute) , Kim, Heejin (Research Center for Materials Analysis, Korea Basic Science Institute) , Park, Sungsoo (Department of Science Education, Jeonju University)
Abstract While aluminum nitride (AlN) holds the great promise for futuristic optoelectronic applications, the efficient growth of single-crystalline AlN with high crystallinity remains the challenge. We visualize that VAl-3ON point defect complex in aluminum nitride films encourages high crystallin...
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