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High crystalline aluminum nitride via highly enhanced adatom diffusion driven by point defect complex

Applied surface science, v.505, 2020년, pp.144615 -   

Lee, Moonsang (Research Center for Materials Analysis, Korea Basic Science Institute) ,  Yang, Mino (Seoul Center, Korea Basic Science Institute Seoul) ,  Lee, Hae-Yong (LumiGNtech Co. Ltd.) ,  Lee, Hyun Uk (Research Center for Materials Analysis, Korea Basic Science Institute) ,  Kim, Heejin (Research Center for Materials Analysis, Korea Basic Science Institute) ,  Park, Sungsoo (Department of Science Education, Jeonju University)

Abstract AI-Helper 아이콘AI-Helper

Abstract While aluminum nitride (AlN) holds the great promise for futuristic optoelectronic applications, the efficient growth of single-crystalline AlN with high crystallinity remains the challenge. We visualize that VAl-3ON point defect complex in aluminum nitride films encourages high crystallin...

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참고문헌 (39)

  1. ACS Appl. Mater. Interfaces Shahab 2018 Using mosaicity to tune thermal transport in polycrystalline aluminum nitride thin films 

  2. Sci. Rep. Tran 5 14734 2015 10.1038/srep14734 Direct growth and controlled coalescence of thick AlN template on micro-circle patterned Si substrate 

  3. J. Cryst. Growth Baker 403 29 2014 10.1016/j.jcrysgro.2014.06.018 Hydride vapor phase epitaxy of AlN using a high temperature hot-wall reactor 

  4. Appl. Phys. Lett. Banal 92 241905 2008 10.1063/1.2937445 Initial nucleation of AlN grown directly on sapphire substrates by metal-organic vapor phase epitaxy 

  5. Scripta Mater. Liu 154 45 2018 10.1016/j.scriptamat.2018.05.017 Defects induced broad spectral photoresponse of PVT-grown bulk AlN crystals 

  6. Coatings Boichot 7 136 2017 10.3390/coatings7090136 Epitaxial growth of AlN on (0001) sapphire: assessment of HVPE process by a design of experiments approach 

  7. Thin Solid Films Claudel 573 140 2014 10.1016/j.tsf.2014.11.022 Influence of the V/III ratio in the gas phase on thin epitaxial AlN layers grown on (0001) sapphire by high temperature hydride vapor phase epitaxy 

  8. 10.1115/IMECE2011-65925 D. Endres, S. Mazumder, Numerical investigation of pulsed chemical vapor deposition of aluminum nitride to reduce particle formation, in: ASME 2011 International Mechanical Engineering Congress and Exposition, American Society of Mechanical Engineers, 2011, pp. 1275-1283. 

  9. Appl. Phys. Express Takeuchi 1 021102 2008 10.1143/APEX.1.021102 Improvement of Al-polar AlN layer quality by three-stage flow-modulation metalorganic chemical vapor deposition 

  10. J. Cryst. Growth Zeimer 377 32 2013 10.1016/j.jcrysgro.2013.04.041 High quality AlGaN grown on ELO AlN/sapphire templates 

  11. J. Am. Chem. Soc. Qi 140 11935 2018 10.1021/jacs.8b03871 Fast growth of strain-free AlN on graphene-buffered sapphire 

  12. J. Alloys Compd. Wang 644 444 2015 10.1016/j.jallcom.2015.05.032 Effect of Al substrate nitridation on the properties of AlN films grown by pulsed laser deposition and its mechanism 

  13. Comput. Mater. Sci. Kresse 6 15 1996 10.1016/0927-0256(96)00008-0 Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set 

  14. Phys. Rev. Lett. Perdew 77 3865 1996 10.1103/PhysRevLett.77.3865 Generalized gradient approximation made simple 

  15. ACS Appl. Mater. Interfaces Fang 10 30811 2018 10.1021/acsami.8b08242 Wurtzite AlN(0001) surface oxidation: hints from ab initio calculations 

  16. IEEE Electron Device Lett. Zou 37 636 2016 10.1109/LED.2016.2548488 Fully vertical GaN pin diodes using GaN-on-Si epilayers 

  17. Mol. Phys. Shao 113 184 2015 10.1080/00268976.2014.952696 Advances in molecular quantum chemistry contained in the Q-Chem 4 program package 

  18. Physical Review B Monkhorst 13 5188 1976 10.1103/PhysRevB.13.5188 Special points for Brillouin-zone integrations 

  19. J. Alloys Compd. Balaji 526 103 2012 10.1016/j.jallcom.2012.02.111 Effects of AlN nucleation layers on the growth of AlN films using high temperature hydride vapor phase epitaxy 

  20. J. Eur. Ceram. Soc. Dorignac 13 345 1994 10.1016/0955-2219(94)90010-8 Transmission electron microscopy studies of AlN deposits 

  21. ACS Appl. Mater. Interfaces Singh 10 20085 2018 10.1021/acsami.8b02899 Using mosaicity to tune thermal transport in polycrystalline aluminum nitride thin films 

  22. J Nanomater Shih 2014 2 2014 10.1155/2014/643672 Design and fabrication of nanoscale IDTs using electron beam technology for high-frequency saw devices 

  23. J. Mater. Res. Harris 5 1763 1990 10.1557/JMR.1990.1763 On the nature of the oxygen-related defect in aluminum nitride 

  24. J. Appl. Phys. Dovidenko 82 4296 1997 10.1063/1.366236 Characteristics of stacking faults in AlN thin films 

  25. Appl. Phys. Lett. Chang 114 091107 2019 10.1063/1.5081112 Graphene-assisted quasi-van der Waals epitaxy of AlN film for ultraviolet light emitting diodes on nano-patterned sapphire substrate 

  26. Phys. Rev. B Chan 77 235430 2008 10.1103/PhysRevB.77.235430 First-principles study of metal adatom adsorption on graphene 

  27. Appl. Phys. Lett. Cho 93 111904 2008 10.1063/1.2985816 Reduction of stacking fault density in m-plane GaN grown on SiC 

  28. Appl. Phys. Lett. Jain 93 051113 2008 10.1063/1.2969402 Migration enhanced lateral epitaxial overgrowth of AlN and AlGaN for high reliability deep ultraviolet light emitting diodes 

  29. Phys. Rev. B Kazaryan 63 184102 2001 10.1103/PhysRevB.63.184102 Grain growth in systems with anisotropic boundary mobility: analytical model and computer simulation 

  30. J. Appl. Phys. Uedono 105 2009 10.1063/1.3079333 Vacancy-oxygen complexes and their optical properties in AlN epitaxial films studied by positron annihilation 

  31. Superlattices Microstruct. Rong 93 27 2016 10.1016/j.spmi.2016.02.050 Residual stress in AlN films grown on sapphire substrates by molecular beam epitaxy 

  32. Phys. Rev. B Prokofyeva 63 125313 2001 10.1103/PhysRevB.63.125313 Vibrational properties of AlN grown on (111)-oriented silicon 

  33. Appl. Phys. Lett. Wagner 77 346 2000 10.1063/1.127009 Phonon deformation potentials of α-GaN and-AlN: An ab initio calculation 

  34. Le Journal de Physique IV Gálvez 7 1997 Tensile strength measurements of ceramic materials at high rates of strain 

  35. J. Am. Ceram. Soc. Chen 79 579 1996 10.1111/j.1151-2916.1996.tb07913.x Static and dynamic compressive behavior of aluminum nitride under moderate confinement 

  36. J. Mech. Phys. Solids Hu 59 1076 2011 10.1016/j.jmps.2011.02.003 The compressive failure of aluminum nitride considered as a model advanced ceramic 

  37. Phil. Mag. Zong 84 3353 2004 10.1080/14786430412331283604 Tensile strength of aluminium nitride films 

  38. B. Wu, J. Bai, V. Tassev, M.L. Nakarmi, W. Sun, X. Huang, M. Dudley, H. Zhang, D. Bliss, J. Lin, Stress evolution during the early stages of AlN vapor growth, in: materials research society symposium proceedings, Warrendale, Pa.; Materials Research Society; 1999, 2006, pp. 653. 

  39. J. Appl. Phys. Bhandari 101 033528 2007 10.1063/1.2432376 Competition between tensile and compressive stress creation during constrained thin film island coalescence 

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