IPC분류정보
국가/구분 |
United States(US) Patent
공개
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0667479
(2012-11-02)
|
공개번호 |
US-0112288
(2013-05-09)
|
발명자
/ 주소 |
|
출원인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
0 |
초록
▼
A system and method employing a heater-orifice may be used to heat a flow path and to control the supply of vapor from a vaporizable material to an object. Variable or constant diameter heating rods may be used to apply heat to a flow path in order to control the supply of vapor from a vaporizable m
A system and method employing a heater-orifice may be used to heat a flow path and to control the supply of vapor from a vaporizable material to an object. Variable or constant diameter heating rods may be used to apply heat to a flow path in order to control the supply of vapor from a vaporizable material. A baffle plate may be used to control the vapor pressure and vapor flow from a vessel containing a vaporizable material. The heater-orifice, heating rods, and baffle plate may be used alone or in combination with one another to control the flow of vaporizable material.
대표청구항
▼
1. A vapor deposition system comprising: a vessel for holding a vaporizable material;a flow path for directing a vapor stream from said vessel; anda heater-orifice for receiving the vapor stream from said flow path and for providing a vapor stream outlet, said heater-orifice configured to emit heat,
1. A vapor deposition system comprising: a vessel for holding a vaporizable material;a flow path for directing a vapor stream from said vessel; anda heater-orifice for receiving the vapor stream from said flow path and for providing a vapor stream outlet, said heater-orifice configured to emit heat, which heats the vapor stream as it passes through said heater-orifice. 2. (canceled) 3. The system of claim 1, further comprising a heat shield provided adjacent the heater-orifice to reduce the heat loss from the heater-orifice. 4. The system of claim 3, further comprising an insulator configured to insulate the heat shield from the heater-orifice. 5. The system of claim 3, further comprising an offset between the heater-orifice and the heat shield. 6. The system of claim 3, wherein the heat shield comprises a rounded tip. 7-11. (canceled) 12. The system of claim 1, further comprising: a second vessel for holding a vaporizable material; anda second flow path for directing a second vapor stream from said second vessel;wherein said second flow path and said flow path join before being received by said heater-orifice. 13. The system of claim 12, further comprising a first vapor deflector, a second vapor deflector, and a third vapor deflector, wherein the first vapor deflector and third vapor deflector cooperate to define said flow path, the second vapor deflector and third vapor deflector cooperate to define said second flow path, and the first and second vapor deflectors cooperate to define the joined flow path. 14. The system of claim 13, wherein the vessel is integral with the first vapor deflector and the second vessel is integral with the second vapor deflector. 15-19. (canceled) 20. The system of claim 1, wherein the heater-orifice is formed of a resistive material, said system further comprising an electrical source for passing electrical current through said heater-orifice. 21. The system of claim 1, wherein the heater-orifice is formed of an inductive material, said system further comprising an inductive heater for heating said heater-orifice. 22-32. (canceled) 33. The system of claim 1, wherein the heater-orifice is removable from the vapor deposition system. 34. (canceled) 35. The system of claim 1, further comprising an elongated aperture in the heater-orifice that comprises a width, wherein the width is constant along the length of the aperture. 36. The system of claim 1, further comprising an elongated aperture in the heater-orifice that comprises a width, wherein the width at a first point along the elongated aperture is greater than the width at a second point along the elongated aperture. 37. The system of claim 36, wherein the width increases continuously from the width at the second point to the width at the first point. 38. The system of claim 1, further comprising an elongated aperture in the heater-orifice that comprises a first width at a first segment along the elongated aperture and a second width at a second segment along the elongated aperture, wherein the first width is greater than the second width to form a stepped pattern. 39. The system of claim 38, wherein the elongated aperture further comprises a third width at a third segment along the elongated aperture, wherein the third width is greater than the first and second widths. 40-48. (canceled) 49. A vapor deposition system comprising: a vessel for holding a vaporizable material;a flow path for directing a vapor stream from said vessel;an aperture configured to direct the vapor stream from said flow path onto a substrate; anda baffle plate covering a portion of a longitudinal extent of the vessel, wherein the baffle plate is configured to vary a vapor pressure of the vaporizable material along the longitudinal extent of said vessel. 50. The system of claim 49, wherein the baffle plate comprises a slit opening which extends longitudinally along the longitudinal extent of the vessel. 51. The system of claim 50, wherein the slit opening comprises a width, wherein the width of the slit opening increases continuously from a center of the longitudinal extent of the vessel to an end of the longitudinal extent of the vessel. 52. The system of claim 50, wherein the slit opening comprises a first width at a first point along the slit opening and a second width at a second point along the slit opening, wherein the first width is greater than the second width. 53. The system of claim 50, wherein the slit opening comprises a stepped opening such that the slit opening has a first width along a first portion of the slit opening and a second width along a second portion of the slit opening, wherein the first width is greater than the second width. 54. The system of claim 53, wherein the slit opening further comprises a third width along a third portion of the slit opening, wherein the third width is greater than both the first and second widths. 55. The system of claim 49, wherein the baffle plate comprises a perforated area, wherein the perforated area comprises a plurality of perforations. 56. The system of claim 55, wherein the perforate area comprises a width along the longitudinal extent of the vessel, wherein the width is at a first portion of the baffle plate is greater than the width at a second portion of the baffle plate. 57. The system of claim 49, further comprising a second baffle plate located along the flow path between the vessel and the heater-orifice. 58. The system of claim 57, wherein the second baffle plate comprises at least one slit opening which extends longitudinally along the longitudinal extent of the vessel. 59. A vapor deposition system comprising: a vessel for holding a vaporizable material;a flow path for directing a vapor stream from said vessel;an aperture configured to direct the vapor stream from said flow path onto a substrate; anda plurality of spaced heating rods for heating the flow path, wherein at least one heating rod comprises a first diameter at a first portion of its length and a second diameter at a second portion of its length, wherein the first diameter is greater than the second diameter. 60. The system of claim 59, wherein at least one of the plurality of heating rods is embedded into the vessel. 61. The system of claim 59, further comprising at least one vapor deflector that defines the flow path. 62. The system of claim 61, wherein at least one of the plurality of heating rods is embedded into the at least one vapor deflector. 63. The system of claim 59, wherein at least one heating rod is formed of a resistive material, said system further comprising an electrical source for passing electrical current through said heating rod. 64. The system of claim 59, wherein at least one heating rod is formed of an inductive material, said system further comprising an inductive heater for heating said at least one heating rod. 65. The system of claim 63, wherein said electrical source is capable of passing electrical current through the first heating rod formed of resistive material and a second heating rod formed of resistive material, further wherein said electrical source is capable of passing electrical current through the first heating rod independently from the second heating rod. 66. The system of claim 59, wherein at least some of the plurality of spaced heating rods are electrically connected in parallel. 67. The system of claim 59, wherein at least some of the plurality of spaced heating rods are electrically connected in series. 68. The system of claim 59, wherein at least one heating rod comprises at least two segments combined to form the at least one heating rod. 69. The system of claim 59, wherein at least one heating rod comprises a unitary element. 70. The system of claim 59, wherein at least a second heating rod comprises a longitudinal extent and a diameter, wherein said diameter is substantially constant along the longitudinal extent of the second heating rod. 71. The system of claim 70, wherein said diameter of the second heating rod is not equal to either the first diameter or the second diameter of the first heating rod. 72. The system of claim 59, wherein at least a second heating rod comprises a third diameter and a fourth diameter, wherein the third diameter is not equal to the first diameter or the second diameter and is greater than the fourth diameter. 73-80. (canceled)
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