TYPE OF FINE METAL MASK (FFM) USED IN OLED PRODUCTION AND THE METHOD OF MANUFACTURING IT
원문보기
IPC분류정보
국가/구분
United States(US) Patent
공개
국제특허분류(IPC7판)
C23C-016/04
G03F-007/00
출원번호
US-0184823
(2014-02-20)
공개번호
US-0059643
(2015-03-05)
우선권정보
CN-201310400757.5 (2013-09-05)
발명자
/ 주소
Du, Weichong
Han, Jianwei
Mei, Wenhui
출원인 / 주소
Du, Weichong
인용정보
피인용 횟수 :
0인용 특허 :
0
초록▼
A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seaml
A new type of fine metal mask (FMM) used in OLED production and the method of manufacturing it, wherein the FMM includes a frame made of a metal substrate with a plurality of through holes, a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated, said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame, and the method of manufacturing such an FMM comprising the steps of: A. providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size; B. providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient; and C. etching the metal substrate by etching out a pattern area of the metal substrate that corresponds to the pattern area of said fine mask using a chemical etching method to form a plurality of through holes, and creating an outer border area and internal separation area for support of said fine mask.
대표청구항▼
1. A fine metal mask used in OLED production comprising: a frame made of a metal substrate with a plurality of through holes;a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated;wherein said fine mask is divided into a pattern
1. A fine metal mask used in OLED production comprising: a frame made of a metal substrate with a plurality of through holes;a layer of fine mask electroformed on the surface of the frame so that said fine mask and said frame are seamlessly integrated;wherein said fine mask is divided into a pattern area and a border area, and the pattern area corresponds to the through holes on the frame. 2. The fine metal mask of claim 1 wherein said frame further comprising an outer border area and internal separation area for support of said fine mask. 3. The fine metal mask of claim 1 wherein said frame further comprising a plurality of holes for alignment of the mask; and wherein said frame is made of invar alloy or stainless steel. 4. The fine metal mask of claim 1 wherein said fine mask further comprising: a metal layer with low coefficient of thermal expansion; anda metal base layer for etching-protection. 5. The fine metal mask of claim 4 wherein said metal layer is made of nickel, molybdenum, chromium, platinum, tin, or a ferronickel alloy containing two or more of the foregoing metals. 6. A method of manufacturing an fine metal mask used in OLED production comprising the steps of: A. Providing a metal substrate by cutting an invar alloy or stainless steel plate to a desired size;B. Providing an fine mask by adding a photoresist layer on the metal substrate, exposing a desired pattern onto said photoresist layer, and electroforming a metal base layer and a metal layer with a low thermal expansion coefficient;C. Etching the metal substrate by etching out a pattern area of the metal substrate that corresponds to the pattern area of said fine mask using a chemical etching method to form a plurality of through holes, and creating an outer border area and internal separation area for support of said fine mask. 7. The method of claim 6 wherein step B further comprising the steps of: B1. Cleaning said metal substrate by acid, organic solvent and deionized water ultrasonic for about 5 to 15 minutes and drying in a clean drying box;B2. Coating a photoresist layer on both sides of the metal substrate and adding a protective film on the surface of the bottom photoresist layer;B3. Exposing a pattern onto the photoresist layer using one of the following two methods:Using a traditional exposure system by placing a patterned film or mask on both sides of the metal substrate and then exposing the pattern from the film or mask onto the photoresist layers on both sides of the metal substrate; orUsing a Laser Direct Image (LDI) exposure system by importing a pattern into a computer and exposing onto the photoresist layers on both sides of the metal substrate by scanning using the LDI;B4. Developing the pattern on the top photoresist layer, washing away the soluble composition in the photoresist layer, and exposing the surface of the pattern area and the outer border area of the metal substrate to air;B5. Electroforming a metal base layer on the exposed metal substrate using a metal with high electric conductivity and stable chemical properties;B6. Forming a fine mask by electroforming a metal layer on the top of the metal base layer by using a metal with low thermal expansion coefficient; andB7. Removing the residual portion of the photoresist layer after step B6. 8. The method of claim 7, wherein step C further comprising the steps of: C1. Adding a protective layer to the upper surface of the metal substrate from step B7;C2. Developing the bottom photoresist layer of the metal substrate by removing the protective film, developing the bottom photoresist layer, and exposing the corresponding pattern area of the metal substrate;C3. Etching the pattern area of the metal substrate until the metal base layer is exposed to air wherein the metal base layer is used to protect the pattern area of the top layer from etching;C4. Removing the residual portion of the photoresist layer from step C3;C5. Removing the protective layer. 9. The method of claim 7 wherein the thickness of the metal substrate ranges from 0.5 mm to 5 mm, the thickness of the photoresist layer ranges from 1 μm to 200 μm, the thickness of the metal base layer ranges from 0.1 μm to 4 μm, and the thickness of the fine metal mask ranges from 10 μm to 200 μm. 10. The method of claim 7 wherein the metal base layer is made from one of copper, silver, platinum, or gold; and the protective layer is made of one of paraffin, photoresist, plastic film, metal protective cover, or non-metal protective cover. 11. The method of claim 8 wherein the thickness of the metal substrate ranges from 0.5 mm to 5 mm, the thickness of the photoresist layer rangers from 1 μm to 200 μm, the thickness of the metal base layer ranges from 0.1 μm to 4 μm, and the thickness of the fine metal mask ranges from 10 μm to 200 μm. 12. The method of claim 8 wherein the metal base layer is made from one of copper, silver, platinum, or gold; and the protective layer is made of one of paraffin, photoresist, plastic film, metal protective cover, or non-metal protective cover.
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