초록 ▼

A method of handling a workpiece includes the following steps. A workpiece is placed on a chuck body, wherein the workpiece includes a tape carrier extending beyond a periphery of the chuck body and a workpiece body disposed on the tape carrier, and the chuck body includes a seal ring surrounding th

A method of handling a workpiece includes the following steps. A workpiece is placed on a chuck body, wherein the workpiece includes a tape carrier extending beyond a periphery of the chuck body and a workpiece body disposed on the tape carrier, and the chuck body includes a seal ring surrounding the periphery of the chuck body; the tape carrier is clamped outside the chuck body, wherein the tape carrier leans against the seal ring and an enclosed space is formed between the chuck body, the tape carrier and the seal ring; and a vacuum seal is formed by evacuating gas from the enclosed space to pull the periphery of the workpiece toward the chuck body.

대표청구항 ▼

1. A method of manufacturing a semiconductor package, comprising: providing a semiconductor device on a substrate;providing an encapsulating material over the substrate to at least laterally encapsulate the semiconductor device and form a reconstructed wafer;attaching the reconstructed wafer to a ta

1. A method of manufacturing a semiconductor package, comprising: providing a semiconductor device on a substrate;providing an encapsulating material over the substrate to at least laterally encapsulate the semiconductor device and form a reconstructed wafer;attaching the reconstructed wafer to a tape carrier;debonding the substrate from the reconstructed wafer;providing the reconstructed wafer with the tape carrier on a wafer chuck, wherein the wafer chuck comprises a chuck body and a seal ring surrounding a periphery of the chuck body, and a top surface of the seal ring is higher than a receiving surface of the chuck body;fixing the tape carrier outside the chuck body, wherein the tape carrier leans against the seal ring and an enclosed space is formed between the chuck body, the tape carrier and the seal ring;forming a vacuum seal by evacuating gas from the enclosed space to pull the periphery of the reconstructed wafer toward the chuck body; andprocessing the reconstructed wafer on the wafer chuck. 2. The method as claimed in claim 1, wherein the vacuum seal is applied by a vacuum port on the receiving surface after the tape carrier is fixed outside the chuck body. 3. The method as claimed in claim 1, wherein fixing the tape carrier outside the chuck body comprises clamping the tape carrier by a clamping element disposed at a side of the chuck body. 4. The method as claimed in claim 1, wherein fixing the tape carrier comprises clamping a frame portion of the tape carrier while a tape portion of the tape carrier leans against the seal ring. 5. The method as claimed in claim 1, wherein a vertical distance from an outer edge of the reconstructed wafer to the receiving surface of the chuck body is 1.5 to 5 times as long as a vertical distance from an outer edge of the receiving surface of the chuck body to the tape carrier. 6. The method as claimed in claim 1, wherein the wafer chuck further comprises a supporter disposed at the outermost side surface and comprising a groove, and at least a part of the sealing ring is disposed within the groove. 7. The method as claimed in claim 1, further comprising: providing a plurality of through vias on the substrate before the encapsulating material is provided over the substrate, wherein the encapsulating material laterally encapsulates the plurality of through vias. 8. The method as claimed in claim 1, wherein forming the reconstructed wafer further comprises: forming a redistribution structure over the encapsulating material and the semiconductor device. 9. A method of handling a wafer, comprising: attaching a wafer to a tape carrier;placing the wafer with the tape carrier on a wafer chuck, wherein the wafer chuck comprises a chuck body and a seal ring surrounding a periphery of the chuck body, and a top surface of the seal ring is higher than a receiving surface of the chuck body;clamping the tape carrier outside the chuck body, wherein the tape carrier leans against the seal ring and an enclosed space is formed between the chuck body, the tape carrier and the seal ring;forming a vacuum seal by evacuating gas from the enclosed space to pull the periphery of the reconstructed wafer toward the chuck body; andprocessing the wafer on the wafer chuck. 10. The method as claimed in claim 9, wherein the vacuum seal is applied after the tape carrier is clamped outside the chuck body. 11. The method as claimed in claim 9, wherein clamping the tape carrier outside the chuck body comprises clamping the tape carrier by a clamping element disposed at a side of the chuck body. 12. The method as claimed in claim 11, wherein the clamping element is spaced apart from the seal ring. 13. The method as claimed in claim 9, wherein the tape carrier comprises a tape portion and a frame portion disposed at a periphery of the tape portion for fixing the tape carrier, and clamping the tape carrier comprises clamping the frame portion while the tape portion of the tape carrier leans against the seal ring. 14. The method as claimed in claim 9, wherein a vertical distance from an outer edge of the wafer to the receiving surface of the chuck body is 1.5 to 5 times as long as a vertical distance from an outer edge of the receiving surface of the chuck body to the tape carrier. 15. The method as claimed in claim 9, wherein the wafer chuck further comprises a supporter disposed at the outermost side surface of the chuck body and comprising a groove, and a part of the sealing ring is embedded in the groove. 16. The method as claimed in claim 9, wherein when the wafer with the tape carrier is placed on the wafer chuck, the wafer is in a warped state where a center region of the wafer is in contact with the wafer chuck while a periphery of the wafer warped away from the wafer chuck, and the tape carrier attached to a back surface of the wafer in a conformal manner. 17. The method as claimed in claim 16, wherein when the vacuum seal is formed, the peripheral of the wafer is pulled to be in contact with the wafer chuck. 18. A method of handling a workpiece, comprising: placing a workpiece on a chuck body, wherein the workpiece comprises a tape carrier extending beyond a periphery of the chuck body and a workpiece body disposed on the tape carrier, and the chuck body comprises a seal ring surrounding the periphery of the chuck body;clamping the tape carrier outside the chuck body, wherein the tape carrier leans against the seal ring and an enclosed space is formed between the chuck body, the tape carrier and the seal ring; andforming a vacuum seal by evacuating gas from the enclosed space to pull the periphery of the workpiece toward the chuck body. 19. The method as claimed in claim 18, wherein the workpiece body comprises a semiconductor device, an encapsulating material laterally encapsulating the semiconductor device, and a redistribution structure disposed on the semiconductor device and the encapsulating material. 20. The method as claimed in claim 18, wherein when the workpiece is placed on the chuck body, the workpiece is in a warped state where a center region of the workpiece is in contact with the chuck body while a periphery of the workpiece warped away from the chuck body, and when the vacuum seal is formed, the peripheral of the workpiece is pulled to be in contact with the chuck body.