이 특허를 인용한 특허 (46)

1. Temkin, Henryk; Kazarinov, Rudolf Feodor, Birefringence free optical waveguide structures.

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2. Jonathan Frankel ; Visweswaren Sivaramakrishnan, Chamber liner for high temperature processing chamber.

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3. Faur, Maria; Faur, Horia M.; Faur, Mircea, Compositions to facilitate room temperature growth of an oxide layer on a substrate.

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4. Kobrin, Boris; Nowak, Romuald; Yi, Richard C.; Chinn, Jeffrey D., Controlled deposition of silicon-containing coatings adhered by an oxide layer.

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5. Kobrin, Boris; Nowak, Romuald; Yi, Richard C.; Chinn, Jeffrey D., Controlled deposition of silicon-containing coatings adhered by an oxide layer.

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6. Kobrin, Boris; Chinn, Jeffrey D.; Nowak, Romuald; Yi, Richard C., Controlled vapor deposition of multilayered coatings adhered by an oxide layer.

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7. Kobrin, Boris; Chinn, Jeffrey D.; Nowak, Romuald; Yi, Richard C., Controlled vapor deposition of multilayered coatings adhered by an oxide layer.

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8. Adams Arthur C. (Berkeley Heights NJ), Deposition of doped silicon oxide films.

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9. Lorenzo Joseph P. (Stow MA) Soref Richard A. (Newton Centre MA), Electro-optical silicon devices.

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10. Claude L. Davis, Jr. ; Kenneth E. Hrdina ; Robert Sabia ; Harrie J. Stevens, Extreme ultraviolet soft x-ray projection lithographic method and mask devices.

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11. Davis, Jr., Claude L.; Hrdina, Kenneth E.; Sabia, Robert; Stevens, Harrie J., Extreme ultraviolet soft x-ray projection lithographic method and mask devices.

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12. Davis Jr., Claude L.; Hrdina, Kenneth E., Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements.

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13. Davis, Jr., Claude L.; Hrdina, Kenneth E., Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements.

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14. Heath ; Carl E. ; Grafstein ; Daniel ; Milewski ; John V., Forming a glass on a substrate.

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15. Frankel, Jonathan; Ponnekanti, Hari; Shmurun, Inna; Sivaramakrishnan, Visweswaren, Heater/lift assembly for high temperature processing chamber.

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16. Kobrin, Boris; Chinn, Jeffrey D.; Nowak, Romuald; Yi, Richard C., High aspect ratio performance coatings for biological microfluidics.

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17. Pretterebner, Julius; Auner, Norbert, Hydrogen and energy generation by thermal conversion of silanes.

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18. Bang Won ; Yieh Ellie ; Pham Thanh, Lid assembly for a process chamber employing asymmetric flow geometries.

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19. Frankel Jonathan ; Shmurun Inna ; Sivaramakrishnan Visweswaren ; Fukshansky Eugene, Lid assembly for high temperature processing chamber.

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20. Kemlage Bernard M. (Kingston NY), Low pressure chemical vapor deposition of silicon dioxide with oxygen enhancement of the chlorosilane-nitrous oxide reac.

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21. Peters John W. (Malibu CA), Low temperature process for depositing oxide layers by photochemical vapor deposition.

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22. Lorenzo Joseph P. (Stow MA) Soref Richard A. (Newton Centre MA), Method for fabricating low loss crystalline silicon waveguides by dielectric implantation.

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23. Kuisl Max (Ulm DEX), Method for producing a preform for light waveguides.

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24. Danzuka Toshio (Yokohama JPX) Yokota Hiroshi (Yokohama JPX) Ishiguro Yoichi (Yokohama JPX), Method for producing glass preform for optical fiber.

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25. Wang David Nin-Kou ; White John M. ; Law Kam S. ; Leung Cissy ; Umotoy Salvador P. ; Collins Kenneth S. ; Adamik John A. ; Perlov Ilya ; Maydan Dan, Method for protecting against deposition on a selected region of a substrate.

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26. Atkins Robert Michael ; Windeler Robert Scott, Method of making optical waveguide devices using perchloryl fluoride to make soot.

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27. Blaske Theodore A. (Plano TX) Yu Ho Y. (Richardson TX), Method of passivating a semiconductor device utilizing dual polycrystalline layers.

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28. Best, Michael E.; Davis, Jr., Claude L.; Edwards, Mary J.; Hobbs, Thomas W.; Murray, Gregory L., Method to avoid striae in EUV lithography mirrors.

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29. Patrick A. Van Cleemput ; Ravi Kumar Laxman ; Jen Shu ; Michelle T. Schulberg ; Bunsen Nie, Method to deposit SiOCH films with dielectric constant below 3.0.

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30. Yieh Ellie ; Xia Li-Qun ; Nemani Srinivas, Methods for shallow trench isolation.

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31. Freeman Dean W. (Garland TX), Oxide deposition method.

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32. Hall James T. (Redondo Beach CA) Peters John W. (Malibu CA), Photochemical vapor deposition process for depositing oxide layers.

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33. Kemlage Bernard M. (Kingston NY), Prevention of low pressure chemical vapor deposition silicon dioxide undercutting and flaking.

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34. Villermet Alain,FRX ; Coeuret Fran.cedilla.ois,FRX ; Cocolios Panayotis,FRX ; Inizan Michel,FRX, Process and plant for the production of a gaseous mixture containing a carrier gas an oxidizing gas and a silane.

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35. Sandhu, Gurtej Singh; Thakur, Randhir P S, Process for growing a dielectric layer on a silicon-containing surface using a mixture of NO and O.

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36. Sandhu,Gurtej Singh; Thakur,Randhir P S, Process for growing a dielectric layer on a silicon-containing surface using a mixture of NO and O.

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37. Takagi Mikio (Kawasaki JPX) Maeda Mamoru (Kawasaki JPX) Kamioka Hajime (Yokohama JPX), Process for high pressure oxidation of silicon.

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38. Takagi Mikio (Kawasaki JPX) Maeda Mamoru (Kawasaki JPX) Kamioka Hajime (Yokohama JPX), Process for high pressure oxidation of silicon.

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39. Takagi Mikio (Kawasaki JPX) Maeda Mamoru (Tama JPX) Kamioka Hajime (Yokohama JPX), Process for high pressure oxidation of silicon.

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40. Shimokawa Kimiaki (Tokyo JPX) Hoga Hiroshi (Tokyo JPX), Process for manufacturing a semiconductor device having a contact window defined by an inclined surface of a composite f.

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41. Re Danilo,ITX, Process for manufacturing integrated capacitors in MOS technology.

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42. Schneider Hartmut (Munich DEX) Lebetzki Egon (Munich DEX), Process for the production of glass fiber light conductors.

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43. Frankel Jonathan, Systems and methods for controlling the temperature of a vapor deposition apparatus.

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44. Sivaramakrishnan Visweswaren ; Fong Gary, Systems and methods for detecting end of chamber clean in a thermal (non-plasma) process.

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45. Junro Sakai JP, Thin film deposition apparatus.

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46. Chang Ching T. (San Diego CA), Triple minimum dispersion wavelengths for a high NA single-mode step-index fiber.

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