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Tunable cut-off UV detector based on the aluminum gallium nitride material system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-027/14
  • H01L-031/00
출원번호 US-0658961 (1984-10-09)
발명자 / 주소
  • Khan M. Asif (Burnsville MN) Schulze Richard G. (Hopkins MN) Skogman Richard A. (Plymouth MN)
출원인 / 주소
  • Honeywell Inc. (Minneapolis MN 02)
인용정보 피인용 횟수 : 56  인용 특허 : 2

초록

A method of preparing a UV detector of AlxGa1-xN. Metal organic chemical vapor deposition (MOCVD) is utilized to grow AlN and then AlxGa1-xN on a sapphire substrate. A photodetector structure is fabricated on the AlGaN.

대표청구항

In a solid state UV detector comprising: a. a basal plane sapphire (Al2O3) substrate; b. an epitaxial single-crystalline aluminum nitride (AlN) layer grown on the surface of the substrate; c. An epitaxial single-crystalline aluminum gallium nitride (AlxGa1-xN) layer grown over said AlN layer; and, d

이 특허에 인용된 특허 (2)

  1. Rutz ; Richard Frederick, Fabrication of an epitaxial layer diode in aluminum nitride on sapphire.
  2. Howard James K. (Fishkill NY) White James F. (Newburgh NY), Gold-tantalum-titanium/tungsten alloy contact for semiconductor devices and having a gold/tantalum intermetallic barrier.

이 특허를 인용한 특허 (56)

  1. Khan, Muhammad A.; VanHove, James M.; Olson, Donald T., Aluminum gallium nitride laser.
  2. Wei X. Yang ; Thomas E. Nohava ; Scott A. McPherson ; Robert C. Torreano ; Subash Krishnankutty ; Holly A. Marsh, Back-illuminated heterojunction photodiode.
  3. Cole, Barrett E.; Marta, Terry, Beam intensity detection in a cavity ring down sensor.
  4. Cole, Barrett E., CRDS mirror for normal incidence fiber optic coupling.
  5. Cole, Barrett E., Cavity enhanced photo acoustic gas sensor.
  6. Cole, Barrett E., Cavity ring-down spectrometer having mirror isolation.
  7. Cox, James Allen; Cole, Barrett E., Compact gas sensor using high reflectance terahertz mirror and related system and method.
  8. Fritz, Bernard, Enhanced cavity for a photoacoustic gas sensor.
  9. Matsuoka Takashi (Ibaragi JPX) Sasaki Toru (Ibaragi JPX), Epitaxial Wurtzite growth structure for semiconductor light-emitting device.
  10. Li,Jing; Fan,Zhaoyang; Lin,Jingyu; Jiang,Hongxing, Extreme ultraviolet (EUV) detectors based upon aluminum nitride (ALN) wide bandgap semiconductors.
  11. Machuca,Francisco; Liu,Zhi, Fabrication of group III-nitride photocathode having Cs activation layer.
  12. Katsuhide Manabe JP; Akira Mabuchi JP; Hisaki Kato JP; Michinari Sassa JP; Norikatsu Koide JP; Shiro Yamazaki JP; Masafumi Hashimoto JP; Isamu Akasaki JP, Gallium nitride group compound semiconductor.
  13. Yang Wei ; Nohava Thomas E. ; McPherson Scott A. ; Torreano Robert C. ; Marsh Holly A. ; Krishnankutty Subash, High gain GaN/AlGaN heterojunction phototransistor.
  14. Barany Barbara G. (Falcon Heights MN) Reimer Scott T. (Fagan MN) Ulmer Robert P. (Hopkins MN) Zook J. David (Minneapolis MN), High gain ultraviolet photoconductor based on wide bandgap nitrides.
  15. Cox, James Allen; Higashi, Robert, High reflectance terahertz mirror and related method.
  16. Major Jo S. (San Jose CA) Welch David F. (Menlo Park CA) Scifres Donald R. (San Jose CA), III-V aresenide-nitride semiconductor materials and devices.
  17. Major Jo S. ; Welch David F. ; Scifres Donald R., III-V arsenide-nitride semiconductor.
  18. Flynn,Jeffrey S.; Xin,Huoping; Brandes,George R., III-nitride optoelectronic device structure with high Al AlGaN diffusion barrier.
  19. Higashi, Robert E.; Newstrom-Peitso, Karen M.; Ridley, Jeffrey A., Integral topside vacuum package.
  20. Katsuhide Manabe JP; Akira Mabuchi JP; Hisaki Kato JP; Michinari Sassa JP; Norikatsu Koide JP; Shiro Yamazaki JP; Masafumi Hashimoto JP; Isamu Akasaki JP, Light emitting device.
  21. Manabe Katsuhide,JPX ; Mabuchi Akira,JPX ; Kato Hisaki,JPX ; Sassa Michinari,JPX ; Koide Norikatsu,JPX ; Yamazaki Shiro,JPX ; Hashimoto Masafumi,JPX ; Akasaki Isamu,JPX, Light emitting semiconductor device using gallium nitride group compound.
  22. Manabe Katsuhide,JPX ; Kotaki Masahiro,JPX ; Tamaki Makoto,JPX ; Hashimoto Masafumi,JPX, Light-emitting device of gallium nitride compound semiconductor.
  23. Katsuhide Manabe JP; Akira Mabuchi JP; Hisaki Kato JP; Michinari Sassa JP; Norikatsu Koide JP; Shiro Yamazaki JP; Masafumi Hashimoto JP; Isamu Akasaki JP, Light-emitting semiconductor device using gallium nitride group compound.
  24. Manabe, Katsuhide; Mabuchi, Akira; Kato, Hisaki; Sassa, Michinari; Koide, Norikatsu; Yamazaki, Shiro; Hashimoto, Masafumi; Akasaki, Isamu, Light-emitting semiconductor device using gallium nitride group compound.
  25. Manabe, Katsuhide; Mabuchi, Akira; Kato, Hisaki; Sassa, Michinari; Koide, Norikatsu; Yamazaki, Shiro; Hashimoto, Masafumi; Akasaki, Isamu, Method for manufacturing a gallium nitride group compound semiconductor.
  26. Manabe,Katsuhide; Mabuchi,Akira; Kato,Hisaki; Sassa,Michinari; Koide,Norikatsu; Yamazaki,Shiro; Hashimoto,Masafumi; Akasaki,Isamu, Method for manufacturing a gallium nitride group compound semiconductor.
  27. Manabe, Katsuhide; Mabuchi, Akira; Kato, Hisaki; Sassa, Michinari; Koide, Norikatsu; Yamazaki, Shiro; Hasimoto, Masafumi; Akasaki, Isamu, Method for producing a light-emitting semiconductor device.
  28. Wang, Tao, Method for significant reduction of dislocations for a very high A1 composition A1GaN layer.
  29. Moustakas, Theodore D., Method of making a semiconductor device with exposure of sapphire substrate to activated nitrogen.
  30. Barber, Greg D.; Kurtz, Sarah R., Method of preparing nitrogen containing semiconductor material.
  31. Kraus, Philip A.; Nijhawan, Sandeep; Chua, Thai Cheng, Methods and systems for forming thin films.
  32. Major Jo S. ; Welch David F. ; Scifres Donald R., Methods for forming group III-V arsenide-nitride semiconductor materials.
  33. Jo S. Major ; David F. Welch ; Donald R. Scifres, Methods for forming group III-arsenide-nitride semiconductor materials.
  34. Butcher, Kenneth Scott Alexander, Migration and plasma enhanced chemical vapor deposition.
  35. Butcher, Kenneth Scott Alexander, Migration and plasma enhanced chemical vapor deposition.
  36. Cole,Barrett E.; Higashi,Robert E.; Zins,Christopher J.; Krishnankutty,Subash, Multi-substrate package assembly.
  37. Cole,Barrett E.; Higashi,Robert E.; Zins,Christopher J.; Krishnankutty,Subash, Multi-substrate package assembly.
  38. Cole, Barrett E.; Marta, Terry; Cox, James Allen; Nusseibeh, Fouad, Multiple wavelength cavity ring down gas sensor.
  39. Cole,Barrett E., Multiple wavelength spectrometer.
  40. Takeuchi, Tetsuya; Kaneko, Yawara; Yamada, Norihide; Amano, Hiroshi; Akasaki, Isamu, Nitride semiconductor device.
  41. Cole, Barrett E.; Cox, James A.; Zook, J. David, Optical cavity system having an orthogonal input.
  42. La Forgia, Domenico; De Risi, Arturo Antonio; De Vittorio, Massimo; Cingolani, Roberto; Passaseo, Adriana; Lomascolo, Mauro, Optical system for detecting the concentration of combustion products.
  43. Cole, Barrett E.; Gu, Yuandong, Particle detection using fluorescence.
  44. Moustakas Theodore D. (Dover MA) Misra Mira (Arlington MA), Photodetectors using III-V nitrides.
  45. Goldenberg Barany Barbara ; McPherson Scott A. ; Reimer Scott T. ; Ulmer Robert P. ; Zook J. David ; Hitchell ; deceased Maurice L., Process for forming a high gain, wide bandgap gallium nitride photoconductor having particular sensitivity to ultraviol.
  46. Akasaki Isamu (Nagoya JPX) Sawaki Nobuhiko (Nagoya JPX), Process for growing III-V compound semiconductors on sapphire using a buffer layer.
  47. Reilly David M. (Boxborough MA) Nicoli Anthony M. (Brighton MA) Schulze Richard G. (Hopkins MN) Goldenberg Barbara L. (Minneapolis MN), Pulsed optical source.
  48. Moustakas, Theodore D., Semiconductor device having group III nitride buffer layer and growth layers.
  49. Moustakas,Theodore D., Semiconductor device having group III nitride buffer layer and growth layers.
  50. Tadatomo, Kazuyuki; Okagawa, Hiroaki; Ohuchi, Youichiro; Koto, Masahiro; Hiramatsu, Kazumasa; Hamamura, Yutaka; Shimizu, Sumito, Semiconductor light receiving element.
  51. Cole,Barrett E.; Higashi,Robert E.; Subramanian,Arunkumar; Krishnankutty,Subash, Spectrally tunable detector.
  52. Cole,Barrett E.; Higashi,Robert E.; Subramanian,Arunkumar; Krishnankutty,Subash, Spectrally tunable detector.
  53. Munns,Gordon, Super lattice modification of overlying transistor.
  54. Rowney Kevin T. B., System, method and article of manufacture for conditionally accepting a payment method utilizing an extensible, flexible.
  55. Cox,James A.; Cole,Barrett E., Tunable laser fluid sensor.
  56. Lin,Cha Hsin; Lee,Lurng Shehng, Ultraviolet detector.
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