초록 ▼

A practically fast electroless copper plating solution is provided by adding a specific monoamine as an accelerator. The accelerator should be a tertiary monoamine and cannot be a diamine, does not have a complexing ability for copper ion, and does not contain a ketone or carboxyl group or an unsatu

A practically fast electroless copper plating solution is provided by adding a specific monoamine as an accelerator. The accelerator should be a tertiary monoamine and cannot be a diamine, does not have a complexing ability for copper ion, and does not contain a ketone or carboxyl group or an unsaturated group. Specific examples of such monoamines include triethylamine, tripropylamine, tribenzylamine, N-methyl-piperidine, and tris (4-bromophenyl) amine, N-methylmorpholine.

대표청구항 ▼

An electroless copper plating solution comprising a copper salt, a complexing agent for copper ion, a reducing agent, a pH-adjustor and an accelerator of a monoamine having the following general formula: N－R1－R2)3 where －R1－R2) is an organic group, R1 is independently an alkylene or phenylene group

An electroless copper plating solution comprising a copper salt, a complexing agent for copper ion, a reducing agent, a pH-adjustor and an accelerator of a monoamine having the following general formula: N－R1－R2)3 where －R1－R2) is an organic group, R1 is independently an alkylene or phenylene group or a halogen-substituted derivative thereof, R2 is independently a hydrogen atom, a halogen atom, a phenyl group, a saturated hydrocarbon group which may contain an oxygen atom or a phenylene group in the skeleton thereof, or a halogen- or phenyl-substituted derivative of said saturated hydrocarbon group, and two or three －R1－R2) may constitute a cyclic structure with said N in the formula.