이 특허를 인용한 특허 (45)

1. Gardner Mark I. ; Gilmer Mark C., Advanced isolation structure for high density semiconductor devices.

   상세보기
2. Jacobs,Keren; Eppler,Aaron, Etch with ramping.

   상세보기
3. Yoshida Kazuyoshi,JPX, Etching method.

   상세보기
4. Allen ; III Tuman Earl, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
5. Allen, III, Tuman Earl, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
6. Allen, III, Tuman Earl, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
7. Allen, III, Tuman Earl, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
8. Tuman Earl Allen, III, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
9. Tuman Earl Allen, III, Etching methods, methods of removing portions of material, and methods of forming silicon nitride spacers.

   상세보기
10. Donohoe, Kevin G., Etching of high aspect ratio structures.

    상세보기
11. Donohoe,Kevin G., Etching of high aspect ration structures.

    상세보기
12. Chebi, Robert; Lin, Frank; Winniczek, Jaroslaw W.; Chen, Wan-Lin; Moore, Erin; Zheng, Lily; Lassig, Stephan; Bogart, Jeff; Rusu, Camelia, Fabrication of a silicon structure and deep silicon etch with profile control.

    상세보기
13. McReynolds Darrell, Mechanism for etching a silicon layer in a plasma processing chamber to form deep openings.

    상세보기
14. Landau Charles Robert, Method and apparatus for managing copy on write operations in a virtual memory.

    상세보기
15. Tammy Zheng ; Calvin Todd Gabriel ; Edward K. Yeh, Method for a consistent shallow trench etch profile.

    상세보기
16. Maltabes, John G.; Charles, Alain; Mautz, Karl E.; Petrucci, Joseph, Method for defining alignment marks in a semiconductor wafer.

    상세보기
17. Xu, Songlin; Kusuki, Takakazu; Qian, Xueyu, Method for enhancing etching of TiSix.

    상세보기
18. Huang,Kao Su, Method for rounding bottom corners of trench and shallow trench isolation process.

    상세보기
19. Miller Alan J., Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features.

    상세보기
20. Miller Alan J. ; Vahedi Vahid, Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features.

    상세보기
21. Li Li ; Bradley J. Howard, Method of controlling striations and CD loss in contact oxide etch.

    상세보기
22. Li, Li; Howard, Bradley J., Method of controlling striations and CD loss in contact oxide etch.

    상세보기
23. Li, Li; Howard, Bradley J., Method of controlling striations and CD loss in contact oxide etch.

    상세보기
24. Li, Li; Howard, Bradley J., Method of controlling striations and CD loss in contact oxide etch.

    상세보기
25. Mitsuiki Akira,JPX, Method of etching a layer in a semiconductor device.

    상세보기
26. Li,Li; Howard,Bradley J., Method of plasma etching a substrate.

    상세보기
27. Li,Li; Howard,Bradley J., Method of plasma etching a substrate.

    상세보기
28. Bamnolker, Hanna A.; Yang, Chan Lon; Chowdhury, Saurabu Dutta; Ramkumar, Krishnaswamy T., Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby.

    상세보기
29. Allen, III, Tuman Earl, Methods of forming silicon nitride spacers, and methods of forming dielectric sidewall spacers.

    상세보기
30. Kim,Sun Young, Nonvolatile memory device having STI structure.

    상세보기
31. Kim, Sun-Young, Nonvolatile memory device having STI structure and method of fabricating the same.

    상세보기
32. Kanarik, Keren Jacobs; Eppler, Aaron, Photoresist conditioning with hydrogen ramping.

    상세보기
33. Kanarik,Karen Jacobs; Eppler,Aaron, Photoresist conditioning with hydrogen ramping.

    상세보기
34. Blalock Guy T. ; Becker David S. ; Donohoe Kevin G., Plasma etching methods.

    상세보기
35. Blalock,Guy T.; Becker,David S.; Donohoe,Kevin G., Plasma etching methods.

    상세보기
36. Donohoe, Kevin G.; Stocks, Richard L., Plasma etching methods.

    상세보기
37. Donohoe, Kevin G.; Stocks, Richard L., Plasma etching methods.

    상세보기
38. Arita, Kiyoshi; Iwai, Tetsuhiro, Plasma processing method.

    상세보기
39. Ni, Tuqiang; Jiang, Weinan; Lin, Frank Y.; Huang, Chung-Ho, Plasma processing method and apparatus with control of plasma excitation power.

    상세보기
40. Satoh Toshihiro,JPX, Semiconductor nonvolatile storage and method of fabricating the same.

    상세보기
41. Winniczek, Jaroslaw W.; Chebi, Robert P., Silicon etch with passivation using chemical vapor deposition.

    상세보기
42. Winniczek, Jaroslaw W.; Chebi, Robert P., Silicon etch with passivation using plasma enhanced oxidation.

    상세보기
43. Lyons Christopher F. ; Bandyopadhyay Basab ; Kepler Nick ; Karlsson Olov ; Wang Larry ; Ibok Effiong, Simplified shallow trench isolation formation with no polish stop.

    상세보기
44. Shiraishi Yutaka,JPX, Single crystal pulling apparatus, single crystal support mechanism, and single crystal pulling method.

    상세보기
45. Bian, Zheng, Test pattern for trench poly over-etched step and formation method thereof.

    상세보기
더보기