초록 ▼

A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer

A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.

대표청구항 ▼

[ What is claimed is:] [1.] A method of repairing a mask having a minimum line width, the method comprising the steps of:(a) providing a transparent substrate comprising a surface having a first region and a second region, a light absorbing first material covering said first region to provide a line

[ What is claimed is:] [1.] A method of repairing a mask having a minimum line width, the method comprising the steps of:(a) providing a transparent substrate comprising a surface having a first region and a second region, a light absorbing first material covering said first region to provide a line, said line having an edge said edge, having an edge placement tolerance of 10% of the minimum line width or less, said second region having a transmittance having a transmittance tolerance of 5% or less;(b) inspecting the mask and detecting a defect, said defect in a defect region, said defect including said edge;(c) repairing said defect, wherein all said second region in said defect region and adjacent said defect region has a transmittance within said transmittance tolerance and wherein said edge in said defect region and adjacent said defect region is within said edge placement tolerance.