초록 ▼

The present invention provides a gas vent system for a vacuum chamber. The particle placed onto the wafer after loading out from a vacuum chamber can be greatly reduced by the system design. The gas vent system has a gas supply, an anti-vibrating tube, a gas regulator, a first line, a second line, a

The present invention provides a gas vent system for a vacuum chamber. The particle placed onto the wafer after loading out from a vacuum chamber can be greatly reduced by the system design. The gas vent system has a gas supply, an anti-vibrating tube, a gas regulator, a first line, a second line, a vent valve, and a filter. The anti-vibrating tube is connected after the gas supply for transferring gas without introducing vibration. The gas regulator is connected after the anti-vibrating tube for controlling a flow rate of the gas. The first line is connected after the gas regulator and has a first metering valve. The second line is connected after the gas regulator and is also connected in parallel with the first line. The second line has a second metering valve and an in-line valve in series. The vent valve is connected after the first line and the second line. The filter is connected between the vent valve and the vacuum chamber. In addition, the gas vent system can further include a pressure sensor for detecting a pressure of the vacuum chamber.

대표청구항 ▼

[ What is claimed is:] [1.] A gas vent system for vacuum chamber, said system comprising:a gas supply;an anti-vibrating tube connected after said gas supply for transferring gas without introducing vibration from said gas supply to said vacuum chamber;a gas regulator connected after said anti-vibrat

[ What is claimed is:] [1.] A gas vent system for vacuum chamber, said system comprising:a gas supply;an anti-vibrating tube connected after said gas supply for transferring gas without introducing vibration from said gas supply to said vacuum chamber;a gas regulator connected after said anti-vibrating tube for controlling a flow rate of said gas;a first line with a first metering valve connected after said gas regulator, said first lines allowing said gas to pass through into said vacuum chamber in a first flow rate for minimizing generated particles due to a pressure difference when venting said gas into said vacuum chamber;a second line connected after said gas regulator, said second line being connected in parallel with said first line, said second line having a second metering valve and an in-line valve in series, after said first line starts to vent said gas into said vacuum chamber, said second line allowing said gas to pass through into said vacuum chamber in a second flow rate higher than said first flow rate for increasing a venting rate of said vacuum chamber by opening said first line and said second line at a same time;a vent valve connected after said first line and said second line but before the vacuum chamber; anda filter connected between said vent valve and said vacuum chamber.