초록 ▼

To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by preventing problem of T-shaped resist pattern and reinforcing exposure dependence of solution speed, a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weig

To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by preventing problem of T-shaped resist pattern and reinforcing exposure dependence of solution speed, a mixture of t-BOC protected polyhydroxystyrene polymers having different molecular weight are used as a basic polymer of chemically amplified resist together with PAG. Preferable molecular-weight ratio and mixing ratio of the mixture are 1:5 to 1:20, and 10 to 30 parts by weight of low molecular-weight polymer to 100 parts of high molecular-weight polymer, respectively.

대표청구항 ▼

[ What is claimed is:] [1.] Chemically amplified resist comprising as its active material:(A) a first polyhydroxystyrene polymer having a t-butoxycarbonyl group and a photoacid generator, said first polyhydroxystyrene polymer having an average molecular weight between 8,000 and 30,000, wherein 25% t

[ What is claimed is:] [1.] Chemically amplified resist comprising as its active material:(A) a first polyhydroxystyrene polymer having a t-butoxycarbonyl group and a photoacid generator, said first polyhydroxystyrene polymer having an average molecular weight between 8,000 and 30,000, wherein 25% to 45% of the hydroxyl groups of said first polyhydroxystyrene polymer are protected by said t-butoxycarbonyl group; and,(B) a second polyhydroxystyrene polymer having a t-butoxycarbonyl group, average molecular weight of the second polyhydroxystyrene polymer being equal to or greater than 400 and less than 6,000, wherein 25% to 45% of the hydroxyl groups of said second polyhydroxystyrene polymer are protected by said t-butoxycarbonyl group;wherein (a) the ratio of the average molecular weight of said first polyhydroxystyrene polymer and the average molecular weight of said second polyhydroxystyrene polymer is between 5:1 and 20:1, and (b) wherein 10 to 30 parts by weight of the second polyhydroxstyrene polymer is comprised for 100 parts by weight of the first polyhydroxstyrene polymer. [2.] Chemically amplified resist comprising as its active material:(A) a first polyhydroxystyrene polymer group having a tetrahydropyranyl group and a photoacid generator, said first polyhydroxystyrene polymer having an average molecular weight between 8,000 and 30,000, wherein 25% to 45% of the hydroxyl groups of said first polyhydroxystyrene polymer are protected by said tetrahydropyranyl group; and,(B) a second polyhydroxystyrene polymer having a tetrahydropyranyl group, average molecular weight of the second polyhydroxystyrene polymer being equal to or greater than 400 and less than 6,000, wherein 25% to 45% of the hydroxyl groups of said second polyhydroxystyrene polymer are protected by said tetrahydropyranyl group;wherein (a) the ratio of the average molecular weight of said first polyhydroxystyrene polymer and the average molecular weight of said second polyhydroxystyrene polymer is between 5:1 and 20:1, and (b) wherein 10 to 30 parts by weight of the second polyhydroxystyrene polymer is comprised for 100 parts by weight of the first polyhydroxystyrene polymer.