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[미국특허] Anti-reflection film and display device using the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-070/04
출원번호 US-0402341 (1999-10-04)
우선권정보 JP0253977 (1997-09-18)
국제출원번호 PCT/JP98/01576 (1997-04-04)
§371/§102 date 19991004 (19991004)
국제공개번호 WO-9845734 (1998-10-15)
발명자 / 주소
  • Yasuda Tomokazu,JPX
  • Nakamura Kenichi,JPX
  • Nakamura Taku,JPX
  • Nakamura Kazuhiro,JPX
출원인 / 주소
  • Fuji Photo Film Co., Ltd., JPX
대리인 / 주소
    Burns, Doane, Swecker & Mathis, LLP
인용정보 피인용 횟수 : 50  인용 특허 : 3

초록

An anti-reflection film comprises a high refractive index layer having a refractive index of 1.65-2.40, and a low refractive index layer having a refractive index of 1.20-1.55. Another anti-reflection film comprises only a low refractive index layer having a refractive index of 1.20-1.55. In the inv

대표청구항

[What is claimed is:] [1.]

이 특허에 인용된 특허 (3) 인용/피인용 타임라인 분석

  1. Suzuki Hiroko,JPX ; Takematsu Kiyotaka,JPX ; Tsuchiya Mitsuru,JPX ; Katagiri Hiroomi,JPX, Antireflection film containing ultrafine particles, polarizing plate and liquid crystal display device.
  2. Matsuda Hidemi (Oomiya JPX) Itou Takeo (Kumagaya JPX) Shimizu Kazuhiko (Fukaya JPX), Display device with an anti-reflection film on the display plane.
  3. Taniguchi Takashi (Shiga JPX) Mibae Jiro (Otsu JPX), Process for producing transparent shaped article having enhanced anti-reflective effect.

이 특허를 인용한 특허 (50) 인용/피인용 타임라인 분석

  1. Advincula, Rigoberto; Tsai, Rebecca; Katoh, Kazuya; Pernites, Roderick, Anti-reflection coatings and methods of preparing and using same.
  2. Obayashi,Tatsuhiko; Hosokawa,Takafumi; Nakamura,Kenichi; Okawa,Atsuhiro, Anti-reflection film, method for producing the same, and image display device.
  3. Fukuda, Kenichi; Okamoto, Yasuhiro, Antireflection film, and polarizing plate and image display device using the same.
  4. Matsunaga,Naohiro; Ibuki,Shuntaro, Antireflection film, polarizing plate and image display device.
  5. Wang, Wu-Jing; Wang, Yen-Po; Lee, Yun-Ching; Chen, Joung-Yei; Shih, Hsi-Hsin, Antireflective coating composition, antireflection film, and fabrication method thereof.
  6. Miyazawa, Takashi, Apparatus and method for manufacturing electro-optical devices.
  7. Yoshihara, Toshio; Shinohara, Seiji; Shioda, Satoshi; Suzuki, Hiroko, Coating composition, it's coating layer, antireflection coating, antireflection film, image display and intermediate product.
  8. Ando, Takamasa; Korenaga, Tsuguhiro; Suzuki, Masa-aki; Okada, Yuka, Diffractive optical element with improved light transmittance.
  9. Miyazawa,Takashi, Electro-optical device, film member, laminated film, low refractivity film, laminated multilayer film and electronic appliances.
  10. Yahiaoui, Ali; Quincy, III, Roger Bradshaw; MacDonald, John Gavin; Steindorf, Eric Clayton; Brostin, Joel, Facemasks containing an anti-fog / anti-glare composition.
  11. Pokorny, Richard J.; Klun, Thomas P., Hardcoats having low surface energy and low lint attraction.
  12. Wheatley, John A.; Liu, Tao; Hao, Encai; Kolb, William Blake; Free, Michael Benton, Light source and display system incorporating same.
  13. Wheatley, John A.; Liu, Tao; Hao, Encai; Kolb, William Blake; Free, Michael Benton, Light source and display system incorporating same.
  14. Chang, Do-hoon; Ro, Myong-do; Yoon, Du-seop; Park, In-sik, Light-curable resin composition having antistatic property.
  15. Chang,Do hoon; Ro,Myong do; Yoon,Du seop; Park,In sik, Light-curable resin composition having antistatic property.
  16. Coggio, William D.; Wheatley, John A.; Liu, Tao; Ostlie, Brian W.; Hao, Encai; Kolb, William Blake; Wang, Qingbing; Free, Michael Benton; Steiner, Michael L.; Tapio, Scott M., Lightguide with optical film containing voids and blacklight for display system.
  17. Coggio, William D.; Klun, Thomas P.; Cao, Chuntao, Low refractive index composition comprising fluoropolyether urethane compound.
  18. Jing, Naiyong; Klun, Thomas P.; Cao, Chuntao; Coggio, William D.; Qiu, Zai Ming, Low refractive index composition comprising fluoropolyether urethane compound.
  19. Bell, Brent C., Method of making a polarizer plate.
  20. Kawanishi,Naoyuki; Hayashi,Tadashi, Method of producing anti-glare film.
  21. Chen-Ho, Kui; Ylitalo, Caroline M.; Yang, Yu; Lu, Yongshang; Levin, Alan L.; Lechuga, Hyacinth L.; Kong, Steven H.; Iyer, Suresh S.; Haugan, Ingrid N.; Ali, Mahfuza B., Multilayer composite article.
  22. Wheatley, John A.; Liu, Tao; Hao, Encai, Optical constructions incorporating a light guide and low refractive index films.
  23. Wheatley, John A.; Liu, Tao; Hao, Encai, Optical constructions incorporating a light guide and low refractive index films.
  24. Wheatley, John A.; Liu, Tao; Hao, Encai, Optical constructions incorporating a light guide and low refractive index films.
  25. Hao, Encai; Kolb, William Blake; Wheatley, John A.; Lu, Fei; Haag, Adam D., Optical film for preventing optical coupling.
  26. Sone,Atsushi; Toyoshima,Tetsuya; Arakawa,Kohei, Optical multilayer film, polarizing plate and optical product.
  27. Hori,Takanobu; Tokomoto,Isao; Kajiyama,Hiroshi; Kato,Akira; Onisawa,Kenichi; Abe,Makoto; Hirota,Shoichi; Sugita,Tatsuya; Adachi,Masaya; Kondo,Katsumi, Optical system.
  28. Coggio, William D.; Steiner, Michael L.; Edmonds, William F.; Kamrath, Robert F.; Liu, Lan H.; Hao, Encai, Optically diffuse low refractive index element.
  29. Klun, Thomas P.; Jing, Naiyong; Pokorny, Richard J.; Qiu, Zai-Ming; Pellerite, Mark J.; Coggio, William D.; Walker, Jr., Christopher B., Perfluoropolyether urethane additives having (meth)acryl groups and hard coats.
  30. Klun, Thomas P.; Jing, Naiyong; Pokorny, Richard J.; Qiu, Zai-Ming; Pellerite, Mark J.; Coggio, William D.; Walker, Jr., Christopher B., Perfluoropolyether urethane additives having (meth)acryl groups and hard coats.
  31. Klun, Thomas P.; Jing, Naiyong; Pokorny, Richard J.; Qiu, Zai-Ming; Pellerite, Mark J.; Coggio, William D.; Walker, Jr., Christopher B., Perfluoropolyether urethane additives having (meth)acryl groups and hard coats.
  32. Klun, Thomas P.; Jing, Naiyong; Pokorny, Richard J.; Qiu, Zai-Ming; Pellerite, Mark J.; Coggio, William D.; Walker, Jr., Christopher B., Perfluoropolyether urethane additives having (meth)acryl groups and hard coats.
  33. Klun, Thomas P.; Jing, Naiyong; Pokorny, Richard J.; Qiu, Zai-Ming; Pellerite, Mark J.; Coggio, William D.; Walker, Jr., Christopher B., Perfluoropolyether urethane additives having (meth)acryl groups and hard coats.
  34. Nagase, Junichi; Fang, Bin; Umemoto, Seiji, Polarizing plate having polarizer and ultraviolet shielding layer containing inorganic fine particles and image display apparatus comprising the same.
  35. Nagase, Junichi; Fang, Bin; Umemoto, Seiji; Nagatsuka, Tatsuki, Polarizing plate having ultraviolet shielding layer containing inorganic fine particles and image display apparatus comprising the same.
  36. Kolb, William B.; Hao, Encai; Kolb, Brant U.; Phillips, David L., Process and apparatus for a nanovoided article.
  37. Kolb, William Blake; Hao, Encai; Kolb, Brant U.; Phillips, David L., Process and apparatus for a nanovoided article.
  38. Hanamura,Masaaki; Nishikawa,Michinori; Kumano,Atsushi, Radiation sensitive refractive index changing composition, pattern forming method and optical material.
  39. Hasegawa, Hiroaki; Saitou, Masahiro; Tajima, Munetake; Hasimoto, Hirokazu, Reflection-reducing film.
  40. Schulz, Ulrike; Munzert, Peter; Kaiser, Norbert, Reflection-reducing interference layer system and method for producing it.
  41. Coggio, William D.; Huizinga, John S.; Steiner, Michael L.; Watkins, Robert F.; Hao, Encai; Kolb, William B.; Zhu, Peiwang; Free, Michael Benton; Kolb, Brant U.; Chen-Ho, Kui; Humpal, Paul E.; Smith, Kenneth L.; Tapio, Scott M., Retroreflecting optical construction.
  42. Coggio, William D.; Huizinga, John S.; Steiner, Michael L.; Watkins, Robert F.; Hao, Encai; Kolb, William B.; Zhu, Peiwang; Free, Michael Benton; Kolb, Brant U.; Chen-Ho, Kui; Humpal, Paul E.; Tapio, Scott M.; Smith, Kenneth L., Retroreflecting optical construction.
  43. Coggio, William D.; Huizinga, John S; Steiner, Michael L.; Watkins, Robert F.; Hao, Encai; Kolb, William B.; Zhu, Peiwang; Free, Michael Benton; Kolb, Brant U.; Chen-Ho, Kui; Humpal, Paul E.; Tapio, Scott M.; Smith, Kenneth L., Retroreflecting optical construction.
  44. Free, Michael Benton; Mazurek, Mieczyslaw H.; Thakkar, Bimal V.; Smith, Kenneth L.; Patel, Suman K.; Coggio, William D.; Pekurovsky, Mikhail L.; Chiu, Raymond C., Retroreflective articles including optically active areas and optically inactive areas.
  45. Free, Michael Benton; Thakkar, Bimal V.; Mazurek, Mieczyslaw H.; Smith, Kenneth L.; Patel, Suman K.; Coggio, William D.; Pekurovsky, Mikhail L., Retroreflective articles including optically active areas and optically inactive areas.
  46. Smith, Kenneth L.; Free, Michael Benton; Thakkar, Bimal V.; Chiu, Raymond C., Retroreflective articles including optically active areas and optically inactive areas.
  47. Smith, Kenneth L.; Free, Michael Benton; Thakkar, Bimal V.; Chiu, Raymond C., Retroreflective articles including optically active areas and optically inactive areas.
  48. Cho, Eun-hyoung; Choa, Sung-hoon; Sohn, Jin-seung; Lee, Du-hyun; Kim, Hae-sung, Soft template with alignment mark.
  49. Itoh,Haruhiko; Mikoshiba,Hitoshi; Tamura,Yuji, Transparent electroconductive laminate.
  50. Coggio, William D.; Black, William B.; Weber, Michael F.; Tai, Huiwen, Wide band semi-specular mirror film incorporating nanovoided polymeric layer.

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