초록 ▼

The present invention relates to plasma-enhanced chemical vapor deposition (PECVD) and related chamber hardware. Embodiments of the present invention include a PECVD system for depositing a film of titanium nitride from a TDMAT precursor. The present invention broadly provides a chamber, a gas deliv

The present invention relates to plasma-enhanced chemical vapor deposition (PECVD) and related chamber hardware. Embodiments of the present invention include a PECVD system for depositing a film of titanium nitride from a TDMAT precursor. The present invention broadly provides a chamber, a gas delivery assembly, a pedestal which supports a substrate, and a plasma system to process substrates. In general, the invention includes a chamber body and a gas delivery assembly disposed thereon to define a chamber cavity. A pedestal movably disposed within the chamber cavity is adapted to support a substrate during processing. The gas delivery assembly is supported by the chamber body and includes a temperature control plate and a showerhead mounted thereto. Preferably, the interface between the showerhead and temperature control plate is parallel to a radial direction of the gas delivery assembly to accommodate lateral thermal expansion without separation of the showerhead and the temperature control plate. A blocker plate, or baffle plate, may be disposed between the showerhead and temperature control plate to facilitate dispersion of gases delivered thereto.

대표청구항 ▼

1. A faceplate for a chemical vapor deposition chamber showerhead assembly, comprising:(a) a central monolithic portion comprising an upper face and a lower face and including a plurality of gas outlet holes extending between the upper face and the lower face; and (b) an annular raised shoulder conc

1. A faceplate for a chemical vapor deposition chamber showerhead assembly, comprising:(a) a central monolithic portion comprising an upper face and a lower face and including a plurality of gas outlet holes extending between the upper face and the lower face; and (b) an annular raised shoulder concentrically disposed about a perimeter of the central monolithic portion and having a substantially planar temperature control plate mounting surface disposed generally parallel to the lower face.