초록 ▼

The present invention is directed toward carrier assemblies, planarizing machines with carrier assemblies, and methods for mechanical and/or chemical-mechanical planarization of micro-device workpieces. In one embodiment, a carrier assembly for holding a microelectronic workpiece comprises a head, a

The present invention is directed toward carrier assemblies, planarizing machines with carrier assemblies, and methods for mechanical and/or chemical-mechanical planarization of micro-device workpieces. In one embodiment, a carrier assembly for holding a microelectronic workpiece comprises a head, a backing assembly in the head, and a barrier. The head includes a chamber, a pneumatic line in fluid communication with the chamber through which a pneumatic fluid passes, and a retaining member defining a perimeter portion of a workpiece cavity. The backing assembly is positioned in the head, and the backing assembly can include a plate in the chamber and a diaphragm on one side of the plate. The diaphragm defines a backside portion of the workpiece cavity. The barrier is positioned in the chamber and/or the pneumatic line. The barrier is configured to inhibit contaminants from back-flowing into at least a portion of the pneumatic line. The barrier, for example, can be a membrane or a filter that inhibits or prevents matter such as particulates and/or fluids from passing along at least a portion of the pneumatic line. As a result, when the diaphragm rips, the barrier prevents the planarizing solution from fouling the pneumatic line and/or a rotary coupling.

대표청구항 ▼

1. A method of planarizing a microelectronic workpiece using a carrier assembly having a head including a backing assembly with a diaphragm and a pneumatic control assembly with a pneumatic line, the method comprising:holding a workpiece in the head by contacting the workpiece with the diaphragm of

1. A method of planarizing a microelectronic workpiece using a carrier assembly having a head including a backing assembly with a diaphragm and a pneumatic control assembly with a pneumatic line, the method comprising:holding a workpiece in the head by contacting the workpiece with the diaphragm of the backing assembly; covering a portion of a planarizing surface of a pad with a planarizing solution; pressing the workpiece against the planarizing surface and the planarizing solution by providing a pressure against the workpiece via the backing assembly; and filtering contaminants on a backside of the diaphragm from flowing into the pneumatic line. 2. The method of claim 1 wherein filtering contaminants from flowing into the pneumatic line comprises providing a selective barrier positioned relative to the pneumatic line to inhibit contaminants from flowing into at least a portion of the pneumatic line.3. The method of claim 1 wherein filtering contaminants from flowing into the pneumatic line comprises providing a filter positioned relative to the pneumatic line to inhibit contaminants from flowing into at least a portion of the pneumatic line.4. The method of claim 1 wherein filtering contaminants from flowing into the pneumatic line comprises providing a membrane positioned relative to the pneumatic line to inhibit contaminants from flowing into at least a portion of the pneumatic line.5. The method of claim 1 wherein filterning contaminants from flowing into the pneumatic line comprises providing a selective barrier that includes a membrane that allows air to pass through the pneumatic line and blocks fluid from passing through the pneumatic line.6. A method of planarizing a microelectronic workpiece using a carrier assembly having a head including a backing assembly with a diaphragm and a pneumatic control assembly with a pneumatic line, the method comprising:holding a workpiece in the head by contacting the workpiece with the diaphragm of the backing assembly; covering a portion of a planarizing surface of a pad with a planarizing solution; pressing the workpiece against the planarizing surface and the planarizing solution by providing a pressure against the workpiece via the backing assembly; and inhibiting matter on a backside of the diaphragm from flowing into the pneumatic line. 7. The method of claim 6 wherein inhibiting matter from flowing into the pneumatic line comprises filtering contaminants on the backside of the diaphragm from flowing into at least a portion of the pneumatic line.8. The method of claim 6 wherein inhibiting matter from flowing into the pneumatic line comprises providing a membrane positioned relative to the pneumatic line to inhibit contaminants from flowing into at least a portion of the pneumatic line.9. The method of claim 6 wherein inhibiting matter from flowing into the pneumatic line comprises providing a membrane that inhibits fluids and particulates on the backside of the diaphragm from flowing into at least a portion of the pneumatic line.10. The method of claim 6 wherein inhibiting matter from flowing into the pneumatic line comprises providing a membrane that allows air to pass through the pneumatic line and blocks fluid from passing through the pneumatic line.