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Multiple electron beam system with electron transmission gates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-043/00
출원번호 US-0856111 (2004-05-28)
등록번호 US-7301263 (2007-11-27)
발명자 / 주소
  • Maldonado,Juan R.
  • Coyle,Steven T.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Janah & Associates, P.C.
인용정보 피인용 횟수 : 6  인용 특허 : 34

초록

A multiple electron beam source comprises a photon source to generate a photon beam, a lens to focus the photon beam, a photocathode having a photon receiving surface and an electron emitting surface, and an array of electron transmission gates spaced apart from the electron emitting surface of the

대표청구항

What is claimed is: 1. A multiple electron beam source comprising: (a) a photocathode comprising a photon receiving surface to receive a photon beam and an electron emitting surface to emit electrons; and (b) an array of electron transmission gates having a surface facing the electron emitting surf

이 특허에 인용된 특허 (34)

  1. Kim Yong-hoon,KRX, Acousto-optic modulator and manufacturing method thereof.
  2. Kojima, Shinichi, Charged-particle-beam microlithography apparatus and methods including correction of aberrations caused by space-charge effects.
  3. Chang Tai-Hon P. (Chappaqua NY) Mamin Harry J. (Palo Alto CA) Rugar Daniel (Palo Alto CA), Compact, integrated electron beam imaging system.
  4. Katsuma Toshiaki,JPX, Diffraction type filter having an aberration correction function and wave length selectivity.
  5. Federico Capasso ; Alfred Yi Cho ; Claire F. Gmachl ; Albert Lee Hutchinson ; Deborah Lee Sivco ; Alessandro Tredicucci, Distributed feedback surface plasmon laser.
  6. Miyoshi, Motosuke; Yamazaki, Yuichiro; Okumura, Katsuya, Electron beam lithography system and pattern writing method.
  7. Mankos, Marian; Krishnamurthi, Vidhya; Lee, Kim Y., Electron beam lithography system using a photocathode with a pattern of apertures for creating a transmission resonance.
  8. Parker, N. William; Brodie, Alan D.; Guo, George Xinsheng; Yin, Edward M.; Matter, Michael C., Electron optics for multi-beam electron beam lithography tool.
  9. Baum Aaron W. ; Schneider ; Jr. James Edward, Electron sources having shielded cathodes.
  10. Baum Aaron Wolf (San Francisco CA) Costello Kenneth A. (Union City CA), Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas.
  11. Ebbesen Thomas W. ; Grupp Daniel E. ; Thio Tineke ; Lezec Henri J.,FRX, Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography.
  12. Thio, Tineke; Linke, Richard A.; Pellerin, Kelly M.; Ebbesen, Thomas W.; Lezec, Henri J., Enhanced optical transmission apparatus with improved aperture geometry.
  13. Kim Tae Jin ; Krishnan Ajit ; Thio Tineke ; Lezec Henri Joseph,FRX ; Ebbesen Thomas W.,FRX, Enhanced optical transmission apparatus with improved inter-surface coupling.
  14. Santilli Vincent J. (Corning NY) Vine James (Pittsburgh PA), Gateable electron image intensifier.
  15. Kim Y. Lee ; Tai-Hon Philip Chang ; Marian Mankos ; C. Neil Berglund, Gated photocathode for controlled single and multiple electron beam emission.
  16. Caserta Joseph N. (Roanoke VA) Mims William D. (Roanoke VA) Crenshaw David A. (Roanoke VA), Gated voltage apparatus for high light resolution and bright source protection of image intensifier tube.
  17. Scherer, Axel; Vuckovic, Elena, High resolution electron projection.
  18. Suyama Motohiro (Hamamatsu JPX) Kinoshita Katsuyuki (Hamamatsu JPX), Imaging device with high speed shuttering.
  19. Costello Kenneth A. ; Aebi Verle W. ; Weiss Robert E., Integrated photocathode.
  20. Takahashi Akira (Hamamatsu) Nishizawa Mitsunori (Hamamatsu JPX), Method for driving a photoelectric device and a method for driving an image intensifier using the photocathode device.
  21. Lee Kim Y. ; Chang Tai-Hon Philip ; Mankos Marian ; Berglund C. Neil, Method of forming gated photocathode for controlled single and multiple electron beam emission.
  22. Takahashi Akira (Shizuoka JPX), Method of gating electron tube and the electron tube operated by said method.
  23. Lee H. Veneklasen ; Marian Mankos ; Bart Scholte van Mast, Moving photocathode with continuous regeneration for image conversion in electron beam lithography.
  24. Marian Mankos ; Steven T Coyle ; Andres Fernandez ; Tai-Hon P Chang, Multiple beam electron beam lithography system.
  25. Jeffrey S. Sullivan ; Steven Coyle ; Andres Fernandez ; Marian Mankos, Optical coupling to gated photocathodes.
  26. Block Barry ; Thorton Arnold, Optical head with a diffractive lens for focusing a laser beam.
  27. Kim Tae Jin ; Thio Tineke ; Ebbesen Thomas Wren, Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes.
  28. Arnold, Andrew D.; Cok, Ronald S., Organic light emitting diode display with surface plasmon outcoupling.
  29. Andres Fernandez ; Marian Mankos ; Tai-Hon Philip Chang ; Kim Lee ; Steven T. Coyle, Patterned heat conducting photocathode for electron beam source.
  30. Niigaki Minoru (Hamamatsu JPX) Kinoshita Katsuyuki (Hamamatsu JPX) Hirohata Toru (Hamamatsu JPX) Ihara Tuneo (Hamamatsu JPX) Yamada Masami (Hamamatsu JPX) Asakura Norio (Hamamatsu JPX) Negi Yasuharu , Photocathode capable of detecting position of incident light in one or two dimensions, phototube, and photodetecting app.
  31. Feldman Martin (Baton Rouge LA), Scanning systems for high resolution e-beam and X-ray lithography.
  32. Payne Leslie, Segmented cold cathode display panel.
  33. Ebbesen Thomas W. ; Ghaemi Hadi F. ; Thio Tineke ; Wolff Peter A., Sub-wavelength aperture arrays with enhanced light transmission.
  34. Boni, Robert; Jaanimagi, Paul, System for photometric calibration of optoelectronic imaging devices especially streak cameras.

이 특허를 인용한 특허 (6)

  1. Wieland, Marco Jan-Jaco; Kampherbeek, Bert Jan; Van Veen, Alexander Hendrik Vincent; Kruit, Pieter, Electron beam exposure system.
  2. Bonam, Ravi K., Integrated photoemission sources and scalable photoemission structures.
  3. Bonam, Ravi K., Integrated photoemission sources and scalable photoemission structures.
  4. Zewail, Ahmed H.; Baskin, John Spencer; Liu, Haihua, Method and system for electron microscope with multiple cathodes.
  5. Walther, Steven R.; Friedman, Gerald M.; Bufano, Michael L., Methods and apparatuses for reducing heat on an emitter exit window.
  6. Zhou, Wei; Fu, Yongqi; Lim, Enk Ng, Plasmonic structure lens and its application for online inspection.
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