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Topcoats for use in immersion lithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/11
출원번호 US-0621132 (2007-01-09)
등록번호 US-7348127 (2008-03-25)
발명자 / 주소
  • Hinsberg, III,William Dinan
출원인 / 주소
  • International Business Machines Corporation
대리인 / 주소
    Schmeiser, Olsen & Watts
인용정보 피인용 횟수 : 26  인용 특허 : 9

초록

A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in

대표청구항

What is claimed is: 1. A topcoat composition, comprising: a polymer comprising: a first monomer having the structure: a second monomer having the structure: where R1 is selected from the group consisting of a carboxylic acid group having 1 to 4 carbon atoms, R2 is an alkyl ester group of

이 특허에 인용된 특허 (9)

  1. Curry James F. ; Goehner ; Jr. Ronald H. ; Narayanan Kolazi S. ; Jon Domingo, Aqueous, flowable suspension concentrate of an agriculturally active chemical, and sprayable use formulation thereof.
  2. Takano Yusuke,JPX ; Tanaka Hatsuyuki,JPX ; Takano Kiyofumi,JPX ; Hashimoto Yutaka,JPX, Composition for reflection reducing coating.
  3. Wang Yongcai (Penfield NY) Anderson Charles C. (Penfield NY), Imaging element.
  4. Jung, Jae Chang; Kong, Keun Kyu; Koh, Cha Won; Kim, Jin Soo; Baik, Ki Ho, Over-coating composition for photoresist, and processes for forming photoresist patterns using the same.
  5. Pappas, Socrates Peter; Baumann, Harald; Dwars, Udo; Savariar-Hauck, Celin M.; Timpe, Hans-Joachim, Overcoat for light-sensitive materials comprising (1-vinylimidazole) polymer or copolymer.
  6. Anderson Charles C. (Penfield NY) Wang Yongcai (Penfield NY), Photographic support comprising an antistatic layer and a protective overcoat.
  7. Sakai Jun (Nagoya JPX), Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer.
  8. Takeda Katsuyuki,JPX ; Kawakami Sota,JPX ; Maejima Katsumi,JPX ; Nakatani Koichi,JPX ; Matsumoto Shinji,JPX, Presensitized lithographic printing plate and method for preparing lithographic printing plate.
  9. Chandross Edwin Arthur ; Nalamasu Omkaram ; Reichmanis Elsa ; Taylor Gary Newton ; Thompson Larry Flack, Process for fabricating a device.

이 특허를 인용한 특허 (26)

  1. Tsubaki, Hideaki, Method of forming patterns.
  2. Tsubaki, Hideaki, Method of forming patterns.
  3. Tsubaki, Hideaki, Method of forming patterns.
  4. Tsubaki, Hideaki, Method of forming patterns.
  5. Tsubaki, Hideaki, Method of forming patterns.
  6. Tsubaki, Hideaki, Method of forming patterns.
  7. Tsubaki, Hideaki, Method of forming patterns.
  8. Tsubaki, Hideaki, Method of forming patterns.
  9. Tsubaki, Hideaki, Method of forming patterns.
  10. Tsubaki, Hideaki, Pattern forming method.
  11. Tsubaki, Hideaki, Pattern forming method.
  12. Tarutani, Shinji; Tsubaki, Hideaki; Mizutani, Kazuyoshi; Wada, Kenji; Hoshino, Wataru, Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method.
  13. Tarutani, Shinji; Tsubaki, Hideaki; Mizutani, Kazuyoshi; Wada, Kenji; Hoshino, Wataru, Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method.
  14. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  15. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  16. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  17. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  18. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  19. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  20. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  21. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  22. Tsubaki, Hideaki; Kanna, Shinichi, Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method.
  23. Tsubaki, Hideaki; Tarutani, Shinji; Mizutani, Kazuyoshi; Wada, Kenji; Hoshino, Wataru, Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method.
  24. Tsubaki, Hideaki; Tarutani, Shinji; Mizuyoshi, Kazuyoshi; Wada, Kenji; Hoshino, Wataru, Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method.
  25. Tsubaki, Hideaki, Resist composition for negative tone development and pattern forming method using the same.
  26. Nozaki, Koji; Kozawa, Miwa, Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same.
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